⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3229663 | 0.77 | — | — | |
| Hydrochloric Acid SCHEMBL7554851 | 0.73 | — | — | |
| SCHEMBL6277205 | 0.71 | — | — | |
| SCHEMBL6906690 | 0.71 | — | — | |
| SCHEMBL10633389 | 0.70 | — | — | |
| SCHEMBL28810755 | 0.70 | — | — | |
| SCHEMBL1373408 | 0.70 | — | — | |
| SCHEMBL20261882 | 0.70 | — | — | |
| SCHEMBL9170345 | 0.70 | — | — | |
| SCHEMBL27885671 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106148914-B | Container for chemical precursors in deposition processes | 弗萨姆材料美国有限责任公司 | 2020-11-20 | — | — | CN | disclosed |
| CN-107365975-B | Delivery container with flow distributor | 弗萨姆材料美国有限责任公司 | 2020-05-05 | — | — | CN | disclosed |
| US-7737028-B2 | Selective ruthenium deposition on copper materials | APPLIED MATERIALS, INC. (US) | 2010-06-15 | — | — | US | disclosed |
| US-20090087982-A1 | SELECTIVE RUTHENIUM DEPOSITION ON COPPER MATERIALS | APPLIED MATERIALS, INC. | 2009-04-02 | — | — | US | disclosed |