SCHEMBL3240183

SCHEMBL3240183

CC[Si](CCCCC[Si](CC)(OC)OC)(OC)OC

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3242432 1.00 LMNA (0.31) LMNA
SCHEMBL3234192 1.00 LMNA (0.31) LMNA
SCHEMBL3239536 1.00 LMNA (0.31) LMNA
SCHEMBL704960 0.97
SCHEMBL5573901 0.92 LMNA (0.41) LMNA
SCHEMBL8852138 0.92 LMNA (0.41) LMNA
SCHEMBL27832436 0.92 LMNA (0.41) LMNA
SCHEMBL4733099 0.92 LMNA (0.41) LMNA
SCHEMBL5573932 0.92 LMNA (0.41) LMNA
SCHEMBL27832274 0.92 LMNA (0.41) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2163664-A1 Method for depositing si-containing film, insulator film, and semiconductor device Shin-Etsu Chemical Co., Ltd. (JP) 2010-03-17 EP disclosed
US-20100061915-A1 METHOD FOR DEPOSITING SI-CONTAINING FILM, INSULATOR FILM, AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-11 US disclosed