SCHEMBL3241040

SCHEMBL3241040

CCC[Si](CCC)(CCCCCC[Si](CCC)(CCC)OC)OC

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.34
TSHR P16473 1/20 0.30
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3233154 1.00 LMNA (0.34) LMNATSHRTHRB
SCHEMBL713105 0.97 LMNA (0.31) LMNA
SCHEMBL5572093 0.95 LMNA (0.41) LMNATSHRTHRB
SCHEMBL14265457 0.95 LMNA (0.41) LMNATSHRTHRB
SCHEMBL14265453 0.95 LMNA (0.41) LMNATSHRTHRB
SCHEMBL14265447 0.95 LMNA (0.41) LMNATSHRTHRB
SCHEMBL5574578 0.95 LMNA (0.41) LMNATSHRTHRB
SCHEMBL14265450 0.92 LMNA (0.38) LMNATSHRTHRB
SCHEMBL707241 0.92 LMNA (0.31) LMNA
SCHEMBL610798 0.89 TSHR (0.44) LMNATSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2163664-A1 Method for depositing si-containing film, insulator film, and semiconductor device Shin-Etsu Chemical Co., Ltd. (JP) 2010-03-17 EP disclosed
US-20100061915-A1 METHOD FOR DEPOSITING SI-CONTAINING FILM, INSULATOR FILM, AND SEMICONDUCTOR DEVICE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-11 US disclosed