Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | DNM1 | Q05193 | 8/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3242411 | 1.00 | LMNA (0.39) | LMNATSHRTHRBDNM1EPHX1 | |
| SCHEMBL3236523 | 1.00 | LMNA (0.39) | LMNATSHRTHRBDNM1EPHX1 | |
| SCHEMBL3243206 | 1.00 | LMNA (0.39) | LMNATSHRTHRBDNM1EPHX1 | |
| SCHEMBL27553365 | 0.97 | TSHR (0.42) | LMNATSHRTHRBDNM1EPHX1 | |
| SCHEMBL27533476 | 0.97 | TSHR (0.42) | LMNATSHRTHRBDNM1EPHX1 | |
| SCHEMBL27529816 | 0.97 | TSHR (0.42) | LMNATSHRTHRBDNM1EPHX1 | |
| SCHEMBL28135335 | 0.97 | TSHR (0.42) | LMNATSHRTHRBDNM1EPHX1 | |
| SCHEMBL7676772 | 0.97 | TSHR (0.42) | LMNATSHRTHRBDNM1EPHX1 | |
| SCHEMBL705913 | 0.97 | LMNA (0.35) | LMNATSHRTHRBDNM1EPHX1 | |
| SCHEMBL8978805 | 0.94 | TSHR (0.44) | LMNATSHRTHRBDNM1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2163664-A1 | Method for depositing si-containing film, insulator film, and semiconductor device | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-03-17 | — | — | EP | disclosed |
| US-20100061915-A1 | METHOD FOR DEPOSITING SI-CONTAINING FILM, INSULATOR FILM, AND SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |