Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.60 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.60 |
| ▸ | LMNA | P02545 | 4/20 | 0.54 |
| ▸ | PRKCA | P17252 | 4/20 | 0.53 |
| ▸ | PRKCE | Q02156 | 2/20 | 0.53 |
| ▸ | PRKCQ | Q04759 | 2/20 | 0.53 |
| ▸ | PRKCD | Q05655 | 2/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.51 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.49 |
| ▸ | DGKA | P23743 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL715876 | 1.00 | MAPT (0.60) | MAPTMAPK1LMNAPRKCAPRKCE | |
| SCHEMBL714245 | 1.00 | MAPT (0.60) | MAPTMAPK1LMNAPRKCAPRKCE | |
| Ethylene SCHEMBL21633977 | 0.97 | MAPT (0.57) | MAPTMAPK1LMNAPRKCAPRKCE | |
| Ethylene SCHEMBL7947908 | 0.97 | MAPT (0.57) | MAPTMAPK1LMNAPRKCAPRKCE | |
| Oxirane SCHEMBL7557475 | 0.93 | MAPT (0.53) | MAPTMAPK1LMNAPRKCAPRKCE | |
| SCHEMBL30932044 | 0.92 | MAPT (0.66) | MAPTMAPK1LMNAPRKCAPRKCE | |
| SCHEMBL10539866 | 0.92 | MAPT (0.66) | MAPTMAPK1LMNAPRKCAPRKCE | |
| SCHEMBL714739 | 0.92 | PRKCA (0.59) | MAPTMAPK1PRKCAPRKCEPRKCQ | |
| SCHEMBL709550 | 0.92 | PRKCA (0.59) | MAPTMAPK1PRKCAPRKCEPRKCQ | |
| Propylene Oxide SCHEMBL6941925 | 0.89 | MAPT (0.49) | MAPTMAPK1LMNAPRKCAPRKCE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11940733-B2 | Treatment device and treatment method | FUJIFILM CORPORATION (JP) | 2024-03-26 | — | — | US | disclosed |
| EP-4067997-A1 | PROCESSING DEVICE AND PROCESSING METHOD | FUJIFILM Corporation (JP) | 2022-10-05 | — | — | EP | disclosed |
| EP-3605232-B1 | TREATMENT METHOD AND TREATMENT DEVICE | FUJIFILM CORP (JP) | 2021-05-05 | — | — | EP | disclosed |
| US-10691022-B2 | Processing method and processing apparatus | FUJIFILM CORPORATION (JP) | 2020-06-23 | — | — | US | disclosed |
| WO-2020066788-A1 | MANUFACTURING METHOD FOR FLEXOGRAPHIC PRINTING ORIGINAL PLATE AND MANUFACTURING DEVICE FOR FLEXOGRAPHIC PRINTING ORIGINAL PLATE | 富士フイルム株式会社 | 2020-04-02 | — | — | WO | disclosed |
| EP-3605232-A1 | TREATMENT METHOD AND TREATMENT DEVICE | Fujifilm Corporation (JP) | 2020-02-05 | — | — | EP | disclosed |
| EP-2183959-A1 | METHOD FOR IMPARTING STRESS TOLERANCE TO PLANT | Kao Corporation (JP) | 2010-05-12 | — | — | EP | disclosed |
| EP-0897136-B1 | DEVELOPING SOLUTION FOR PHOTOSENSITIVE RESIN PLATE | TOYO BOSEKI (JP) | 2003-08-20 | — | — | EP | disclosed |
| EP-0897136-A1 | DEVELOPING SOLUTION FOR PHOTOSENSITIVE RESIN PLATE | Toyo Boseki Kabushiki Kaisha (JP) | 1999-02-17 | — | — | EP | disclosed |