SCHEMBL3259481

SCHEMBL3259481

C=CCN[SiH2]NCC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7179269 0.79
SCHEMBL1080566 0.73
SCHEMBL9052180 0.73
SCHEMBL890319 0.71
SCHEMBL759587 0.67
Formaldehyde SCHEMBL11566715 0.67
SCHEMBL277738 0.65
SCHEMBL22105 0.65
Formaldehyde SCHEMBL4378361 0.64 TSHR (0.36)
SCHEMBL9704233 0.62 ALDH1A1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100069904-A1 Electrosurgical Instrument Having a Coated Electrode Utilizing an Atomic Layer Deposition Technique TYCO HEALTHCARE GROUP LP 2010-03-18 US claimed
WO-2024095441-A1 SEMICONDUCTOR WAFER TRANSPORT CONTAINER AND METHOD FOR MANUFACTURING SAME キオクシア株式会社 2024-05-10 WO disclosed
EP-4320180-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME Momentive Performance Materials Inc. (US) 2024-02-14 EP disclosed
CN-117377716-A Organosilicon pressure-sensitive adhesive and method for preparing same 迈图高新材料公司 2024-01-09 CN disclosed
CN-111295734-A Method and apparatus for increasing reactor process batch size 朗姆研究公司 2020-06-16 CN disclosed
US-9136108-B2 Method for restoring porous surface of dielectric layer by UV light-assisted ALD ASM IP HOLDING B.V. (NL) 2015-09-15 US disclosed
US-20150064932-A1 Method For Restoring Porous Surface Of Dielectric Layer By UV Light-Assisted ALD ASM IP HOLDING B.V. (NL) 2015-03-05 US disclosed
US-8303582-B2 Electrosurgical instrument having a coated electrode utilizing an atomic layer deposition technique TYCO HEALTHCARE GROUP LP (US) 2012-11-06 US disclosed
US-20100069904-A1 Electrosurgical Instrument Having a Coated Electrode Utilizing an Atomic Layer Deposition Technique TYCO HEALTHCARE GROUP LP 2010-03-18 US disclosed
US-20080293096-A1 Enzyme and Template-Controlled Synthesis of Silica from Non-Organic Silicon Compounds as Well as Aminosilanes and Silazanes and Use Thereof NANOTECMARIN GMBH (DE) 2008-11-27 US disclosed
EP-1740707-A1 ENZYME AND TEMPLATE-CONTROLLED SYNTHESIS OF SILICA FROM NON-ORGANIC SILICON COMPOUNDS AS WELL AS AMINOSILANES AND SILAZANES AND USE THEREOF Schwertner, Heiko, Dr. (DE) 2007-01-10 EP disclosed
WO-2005106003-A1 ENZYME AND TEMPLATE-CONTROLLED SYNTHESIS OF SILICA FROM NON-ORGANIC SILICON COMPOUNDS AS WELL AS AMINOSILANES AND SILAZANES AND USE THEREOF SCHWERTNER HEIKO (DE) 2005-11-10 WO disclosed