SCHEMBL3260158

SCHEMBL3260158

CCCCOc1ccccc1S(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)(c1ccccc1)c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 6/20 0.36
CA2 P00918 6/20 0.36
RXFP1 Q9HBX9 1/20 0.36
PTGDR2 Q9Y5Y4 1/20 0.35
CYP1A2 P05177 2/20 0.35
CYP2C9 P11712 2/20 0.35
CYP2C19 P33261 2/20 0.35
ALDH1A1 P00352 1/20 0.34
TSHR P16473 1/20 0.34
ABCB1 P08183 2/20 0.34
PTGS2 P35354 2/20 0.34
PTGS1 P23219 1/20 0.33
CCNE2 O96020 1/20 0.33
CCNE1 P24864 1/20 0.33
CDK2 P24941 1/20 0.33
ABCC1 P33527 1/20 0.32
KMT2A Q03164 1/20 0.32
HIF1A Q16665 1/20 0.32
CYP19A1 P11511 1/20 0.32
GAA P10253 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3136338 1.00 CA1 (0.36) CA1CA2RXFP1PTGDR2CYP1A2
SCHEMBL3132794 0.99 RXFP1 (0.36) CA1CA2RXFP1PTGDR2CYP1A2
SCHEMBL3130515 0.87 RXFP1 (0.41) CA1CA2RXFP1PTGDR2CYP1A2
SCHEMBL3126070 0.85 CA1 (0.44) CA1CA2ALDH1A1TSHRABCB1
SCHEMBL3130573 0.85 CA1 (0.44) CA1CA2ALDH1A1TSHRABCB1
SCHEMBL3104520 0.84 CA1 (0.45) CA1CA2CYP1A2CYP2C9CYP2C19
SCHEMBL3134839 0.79 HSD11B1 (0.42) CA1CA2CYP1A2CYP2C19TSHR
SCHEMBL3143566 0.79 HSD11B1 (0.42) CA1CA2CYP1A2CYP2C19TSHR
SCHEMBL6310046 0.79 CA1 (0.49) CA1CA2CYP1A2CYP2C9CYP2C19
SCHEMBL5857351 0.78 MEN1 (0.46) CA1CA2ALDH1A1KMT2AGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed