⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28573699 | 0.97 | — | — | |
| SCHEMBL1772372 | 0.85 | — | — | |
| SCHEMBL28529871 | 0.83 | — | — | |
| SCHEMBL169810 | 0.83 | — | — | |
| SCHEMBL30195112 | 0.83 | — | — | |
| SCHEMBL23501543 | 0.83 | — | — | |
| SCHEMBL5314264 | 0.83 | — | — | |
| SCHEMBL3148703 | 0.78 | — | — | |
| SCHEMBL10336983 | 0.77 | — | — | |
| SCHEMBL31307794 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 149 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250034351-A1 | COMPOSITE MATRICES VIA INCORPORATION OF CARBON NANOTUBES | R.D. ABBOTT COMPANY, INC. (US) | 2025-01-30 | — | — | US | claimed |
| US-12157806-B2 | Method of making composite matrix via incorporation of carbon nanotubes | R.D. ABBOTT COMPANY, INC. | 2024-12-03 | — | — | US | claimed |
| CN-118993626-A | Soil road agent and preparation method thereof | 广州市正源环境工程有限公司 | 2024-11-22 | — | — | CN | claimed |
| CN-115353334-B | Environment-friendly concrete resistant to chloride ion permeation and preparation method thereof | 温州华邦混凝土有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-113825805-B | Moldable silicone elastomers with selective non-primer adhesion | 洛德公司 | 2023-08-25 | — | — | CN | claimed |
| CN-115353334-A | Environment-friendly concrete resistant to chloride ion permeation and preparation method thereof | 温州华邦混凝土有限公司 | 2022-11-18 | — | — | CN | claimed |
| CN-112513192-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2021-03-16 | — | — | CN | claimed |
| CN-111565859-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2020-08-21 | — | — | CN | claimed |
| EP-2928612-A1 | DISSOLVED AIR FLOTATION, ANTISOLVENT CRYSTALLISATION AND MEMBRANE SEPARATION FOR SEPARATING BUOYANT MATERIALS AND SALTS FROM WATER | Advanced Water Recovery LLC (US) | 2015-10-14 | — | — | EP | claimed |
| WO-2014089443-A1 | DISSOLVED AIR FLOTATION, ANTISOLVENT CRYSTALLISATION AND MEMBRANE SEPARATION FOR SEPARATING BUOYANT MATERIALS AND SALTS FROM WATER | ADVANCED WATER RECOVERY, LLC (US) | 2014-06-12 | — | — | WO | claimed |
| WO-2004073768-A2 | OCCLUSION RESISTANT HYDROCEPHALIC SHUNT | MEDTRONIC, INC. (US) | 2004-09-02 | — | — | WO | claimed |
| EP-1337897-A4 | PHOTOPATTERNABLE SORBENT AND FUNCTIONALIZED FILMS | BATTELLE MEMORIAL INSTITUTE (US) | 2004-08-04 | — | — | EP | claimed |
| WO-2002036652-A9 | PHOTOPATTERNABLE SORBENT AND FUNCTIONALIZED FILMS | BATTELLE MEMORIAL INSTITUTE (US) | 2004-04-29 | — | — | WO | claimed |
| EP-1337897-A2 | PHOTOPATTERNABLE SORBENT AND FUNCTIONALIZED FILMS | BATTELLE MEMORIAL INSTITUTE (US) | 2003-08-27 | — | — | EP | claimed |
| WO-2002036652-A2 | PHOTOPATTERNABLE SORBENT AND FUNCTIONALIZED FILMS | BATTELLE MEMORIAL INSTITUTE (US) | 2002-05-10 | — | — | WO | claimed |
| EP-0672745-B1 | Electrorheological gels and method for preparation | DOW CORNING (US) | 1998-02-25 | — | — | EP | claimed |
| EP-0422614-B1 | Aperture pattern-printing plate for shadow mask and method for manufacturing the same | TOSHIBA KK (JP) | 1996-12-27 | — | — | EP | claimed |
| US-5266352-A | Devices featuring silicone elastomers | AT&T BELL LABORATORIES (US) | 1993-11-30 | — | — | US | claimed |
| US-5134015-A | Amorphous transparent scratch-preventing film, silicone oil layer | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-07-28 | — | — | US | claimed |
| EP-0422614-A2 | Aperture pattern-printing plate for shadow mask and method for manufacturing the same | KABUSHIKI KAISHA TOSHIBA (JP) | 1991-04-17 | — | — | EP | claimed |