SCHEMBL3266492

SCHEMBL3266492

COCCOC(OCCOC)(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.65

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CES1 P23141 2/20 0.65
SRC P12931 1/20 0.44
HPGD P15428 1/20 0.42
HTT P42858 1/20 0.41
TSHR P16473 2/20 0.41
POLB P06746 2/20 0.40
TDP1 Q9NUW8 1/20 0.40
CA2 P00918 1/20 0.40
KCNN4 O15554 1/20 0.40
LMNA P02545 3/20 0.39
SMN1; SMN2 Q16637 2/20 0.38
AKT1 P31749 1/20 0.38
KDM4E B2RXH2 2/20 0.37
ALDH1A1 P00352 2/20 0.37
PTPN1 P18031 1/20 0.37
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9785859 0.95 CES1 (0.59) CES1SRCHPGDHTTTSHR
SCHEMBL9860776 0.87 CES1 (0.64) CES1SRCTSHRTDP1KCNN4
SCHEMBL9785847 0.84 CES1 (0.57) CES1SRCLMNASMN1; SMN2ALDH1A1
SCHEMBL11484128 0.84 CES1 (0.57) CES1SRCTDP1LMNAKDM4E
SCHEMBL11544659 0.84 CES1 (0.56) CES1SRCHPGDHTTTSHR
SCHEMBL9785921 0.83 CES1 (0.55) CES1SRCLMNASMN1; SMN2ALDH1A1
SCHEMBL948686 0.83 CES1 (0.50) CES1SRCHPGDHTTTSHR
SCHEMBL11171387 0.83 CES1 (0.58) CES1SRCTSHRTDP1LMNA
SCHEMBL11483102 0.83 CES1 (0.54) CES1HPGDTSHRPOLBLMNA
SCHEMBL3272321 0.82 CES1 (0.57) CES1SRCHPGDTSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5043361-A Photopolymerizable blend of unsaturated compound, photoinitiator, reducing agent, filler and peroxide G-C DENTAL INDUSTRIAL CORPORATION (JP) 1991-08-27 US claimed
US-4843110-A BLEND CONTAINING A THIOXANTHONE PHOTOINITIATOR G-C DENTAL INDUSTRIAL CORPORATION (JP) 1989-06-27 US claimed
US-4820744-A TWO PARTS-UNSATURATED COMPOUND, INITIATOR, AND REDUCING AGENT SEPARATED FROM ORGANIC PEROXIDE AND FILLER G-C DENTAL INDUSTRIAL CORP. (JP) 1989-04-11 US claimed
US-4804690-A CONTAINING A BENZIL-AND AN ANTROQUINONE-TYPE PHOTOINITIATOR TO CURE BY BOTH VISIBLE AND ULTRAVIOLET LIGHT G-C DENTAL INDUSTRIAL CORPORATION (JP) 1989-02-14 US claimed
US-4771084-A (METH)ACRYLATE MONOMERS, KETAL AND BENZOIN ALKYL ETHER AS PHOTOPOLYMERIZATION INITIATORS, REDUCING AGENT, FILLER G-C DENTAL INDUSTRIAL CORP. (JP) 1988-09-13 US claimed
WO-2025052742-A1 X-RAY RADIOPAQUE COMPOUND AND DENTAL ADHESIVE COMPOSITION 株式会社ジーシー 2025-03-13 WO disclosed
WO-2025047060-A1 GLASS COMPOSITION FOR DENTAL USE AND COMPOSITION FOR DENTAL USE 株式会社ジーシー 2025-03-06 WO disclosed
WO-2024154738-A1 DENTAL RESTORATION MATERIAL COMPOSITION 株式会社ジーシー 2024-07-25 WO disclosed
US-20200093709-A1 POWDER FORMULATION FOR DENTAL COMPOSITE GC CORPORATION (JP) 2020-03-26 US disclosed
US-20160081885-A1 POLYMERIZABLE DENTAL MATERIAL MUHLBAUER TECHNOLOGY GMBH (DE) 2016-03-24 US disclosed
EP-1711542-B1 DIRECTLY PHOTODEFINABLE POLYMER COMPOSITIONS AND METHODS THEREOF PROMERUS LLC (US) 2010-06-09 EP disclosed
US-7378456-B2 Directly photodefinable polymer compositions and methods thereof PROMERUS LLC (US) 2008-05-27 US disclosed
EP-0146501-A2 Polymerizable compositions CIBA-GEIGY AG (CH) 1985-06-26 EP disclosed
US-4518676-A Photopolymerizable compositions containing diaryliodosyl salts CIBA GEIGY CORPORATION (US) 1985-05-21 US disclosed
US-4369207-A PHOTOPOLYMERIZING TEIJIN LIMITED (JP) 1983-01-18 US disclosed
US-4292151-A MELT SPINNING THE BLOCK POLYMER WITH AN UNSATURATED COMPOUND; CURING WITH ACTINIC RADIATION TEIJIN LIMITED (JP) 1981-09-29 US disclosed
US-4269947-A AN AROMATIC DICARBOXYLIC ACID-ACYCLIC GLYCOL-BASED POLYESTER MODIFIED BY AN EPOXY-CONTAINING COMPOUND; IMPROVED PROPERTIES; FILMS AND FIBERS TEIJIN LIMITED (JP) 1981-05-26 US disclosed
EP-0015441-A2 Laminated film structure of aromatic polyester and process for production thereof TEIJIN LIMITED (JP) 1980-09-17 EP disclosed
US-4196066-A UNSATURATED EPOXIDE TEIJIN LIMITED (JP) 1980-04-01 US disclosed
US-4190602-A PHOTOCHEMICAL SENSITIZERS BY REACTION OF SULFUROUS ACID ESTER OR THIONYL CHLORIDE AND A PRIMARY ALCOHOL CIBA-GEIGY CORPORATION (US) 1980-02-26 US disclosed