SCHEMBL948686

SCHEMBL948686

COCCOC(O)(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CES1 P23141 2/20 0.50
SRC P12931 1/20 0.46
HPGD P15428 1/20 0.41
HTT P42858 1/20 0.40
TSHR P16473 2/20 0.40
CHRM3 P20309 2/20 0.40
POLB P06746 3/20 0.39
TDP1 Q9NUW8 1/20 0.39
CA2 P00918 1/20 0.39
KCNN4 O15554 1/20 0.39
LMNA P02545 3/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
AKT1 P31749 1/20 0.37
KDM4E B2RXH2 1/20 0.36
ALDH1A1 P00352 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12003255 0.85 CES1 (0.46) CES1SRCHPGDTSHRTDP1
SCHEMBL2819529 0.83 CES1 (0.45) CES1SRCTSHRTDP1LMNA
SCHEMBL3266492 0.83 CES1 (0.65) CES1SRCHPGDHTTTSHR
SCHEMBL251616 0.82 CES1 (0.50) CES1SRCPOLBKCNN4LMNA
SCHEMBL10609830 0.81 TSHR (0.44) CES1TSHRLMNAALDH1A1
SCHEMBL1470605 0.81 TSHR (0.44) CES1TSHRLMNAALDH1A1
SCHEMBL277653 0.80 CES1 (0.65) CES1SRCTSHRTDP1KCNN4
SCHEMBL9192066 0.79 CES1 (0.47) CES1SRCTSHRPOLBTDP1
SCHEMBL9785859 0.79 CES1 (0.59) CES1SRCHPGDHTTTSHR
SCHEMBL10384203 0.79 CES1 (0.46) CES1SRCHPGDHTTTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240010829-A1 POLYMERIZABLE COMPOSITION AND MANUFACTURING METHOD FOR ELEMENT-MOUNTED SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2024-01-11 US disclosed
EP-3284771-B1 HEAT-RESISTANT RESIN COMPOSITION, METHOD FOR MANUFACTURING HEAT-RESISTANT RESIN FILM, METHOD FOR MANUFACTURING INTERLAYER INSULATION FILM OR SURFACE PROTECTIVE FILM, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR COMPONENT TORAY INDUSTRIES (JP) 2023-08-30 EP disclosed
EP-3800218-A1 TRANSPARENT RESIN COMPOSITION FOR MOLDING AND 3D MOLDED ARTICLE Nabtesco Corporation (JP) 2021-04-07 EP disclosed
EP-3284771-A1 HEAT-RESISTANT RESIN COMPOSITION, METHOD FOR MANUFACTURING HEAT-RESISTANT RESIN FILM, METHOD FOR MANUFACTURING INTERLAYER INSULATION FILM OR SURFACE PROTECTIVE FILM, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR COMPONENT Toray Industries, Inc. (JP) 2018-02-21 EP disclosed
EP-2270110-B1 PIGMENT-DISPERSED COMPOSITION, COLORED PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, COLOR FILTER, LIQUID CRYSTAL DISPLAY ELEMENT, AND SOLID IMAGE PICKUP ELEMENT FUJIFILM CORP (JP) 2015-02-25 EP disclosed
US-8895676-B2 Resin composition and display device using the same TORAY INDUSTRIES, INC. (JP) 2014-11-25 US disclosed
US-20140191222-A1 RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME TORAY INDUSTRIES, INC. (JP) 2014-07-10 US disclosed
US-8709552-B2 Resin composition and display device using the same TORAY INDUSTRIES, INC. (JP) 2014-04-29 US disclosed
US-8514353-B2 Color filter and electronic display device FUJIFILM CORPORATION (JP) 2013-08-20 US disclosed
EP-2218756-B1 PIGMENT DISPERSION COMPOSITION, CURABLE COLOR COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING THE SAME FUJIFILM CORP (JP) 2013-07-31 EP disclosed
EP-0580108-B1 A photosensitive polyimide composition ASAHI CHEMICAL IND (JP) 1997-03-12 EP disclosed
US-5525645-A Resin composition for optical molding ASAHI DENKA KOGYO K.K. (JP) 1996-06-11 US disclosed
US-5434196-A Resin composition for optical molding ASAHI DENKA KOGYO K.K. (JP) 1995-07-18 US disclosed
EP-0439258-B1 Actinic radiation-reactive pressure-sensitive adhesive composition ASAHI DENKA KOGYO KK (JP) 1995-05-03 EP disclosed
EP-0355927-B1 A precursor of a low thermal stress polyimide and a photopolymerizable composition containing a polyimide precursor ASAHI CHEMICAL IND (JP) 1994-11-23 EP disclosed
US-5360873-A Acrylate copolymer, polythiol compound and polyene compound, mounting semiconductor wafers ASAHI DENKA KOGYO K.K. (JP) 1994-11-01 US disclosed
US-5278199-A Comprising polythiol compounds and polyene compounds ASAHI DENKA KOGYO K.K. (JP) 1994-01-11 US disclosed
EP-0439258-A2 Actinic radiation-reactive pressure-sensitive adhesive composition ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) 1991-07-31 EP disclosed
EP-0355927-A2 A precursor of a low thermal stress polyimide and a photopolymerizable composition containing a polyimide precursor Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1990-02-28 EP disclosed
US-4812489-A URETHANE ACRYLATE OLIGOMER, TRIS(2-HYDROXYETHYL)ISOCYANURATE TRIACRYLATE, REACTIVE DILUENT, AND A PHOTOPOLYMERIZATION INIATOR; CLADDING, BUFFER MATERIALS FOR OPTICAL FIBER UNITS THE YOKOHAMA RUBBER CO., LTD. (JP) 1989-03-14 US disclosed