2-Ethoxyethanol

2-Ethoxyethanol

SCHEMBL327080

CCOCCO.COCCOC(C)=O

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.67
TSHR P16473 4/20 0.67
THRB P10828 1/20 0.44
LMNA P02545 1/20 0.43
HSD17B10 Q99714 1/20 0.43
CHRM5 P08912 2/20 0.36
CHRM1 P11229 2/20 0.36
CHRM3 P20309 2/20 0.36
PGR P06401 1/20 0.36
CHRM2 P08172 1/20 0.36
CHRM4 P08173 1/20 0.36
HTR1A P08908 1/20 0.36
CHRNB2 P17787 1/20 0.36
TBXA2R P21731 1/20 0.36
CHRNB4 P30926 1/20 0.36
CHRNA3 P32297 1/20 0.36
CHRNA7 P36544 1/20 0.36
CHRNA4 P43681 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
CHRNA10 Q9GZZ6 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL925610 0.96 ALDH1A1 (0.68) ALDH1A1TSHRTHRBLMNAHSD17B10
2-Ethoxyethanol SCHEMBL9061826 0.96 ALDH1A1 (0.62) ALDH1A1TSHRTHRBLMNAHSD17B10
Diethylene Glycol Monoethyl Ether SCHEMBL28082957 0.96 ALDH1A1 (0.68) ALDH1A1TSHRTHRBLMNAHSD17B10
Diethylene Glycol Monoethyl Ether SCHEMBL29037448 0.96 ALDH1A1 (0.68) ALDH1A1TSHRTHRBLMNAHSD17B10
2-Methoxyethanol SCHEMBL10809132 0.92 ALDH1A1 (0.73) ALDH1A1TSHRTHRBLMNAHSD17B10
2-Ethoxyethanol SCHEMBL2671692 0.92 ALDH1A1 (0.78) ALDH1A1TSHRTHRBLMNAHSD17B10
SCHEMBL5169734 0.90 ALDH1A1 (0.83) ALDH1A1TSHRTHRBLMNAHSD17B10
2-Ethoxyethanol SCHEMBL10895242 0.90 ALDH1A1 (0.83) ALDH1A1TSHRTHRBLMNAHSD17B10
Ethyl Acetate SCHEMBL10561403 0.89 ALDH1A1 (0.57) ALDH1A1TSHRTHRBLMNAHSD17B10
SCHEMBL9633470 0.88 ALDH1A1 (0.79) ALDH1A1TSHRTHRBLMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8618217-B2 Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2013-12-31 US disclosed
US-8092976-B2 High resolution, reduced pattern falling, and good sensitivity and good dissolution contrast achieved even in EUV (extreme ultra violet) exposure, reduction in the line edge roughness FUJIFILM CORPORATION (JP) 2012-01-10 US disclosed
EP-2062950-B1 Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same FUJIFILM CORP (JP) 2011-01-26 EP disclosed
US-20090136878-A1 TOPCOAT COMPOSITION, ALKALI DEVELOPER-SOLUBLE TOPCOAT FILM USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-05-28 US disclosed
EP-2062950-A2 Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same FUJIFILM Corporation (JP) 2009-05-27 EP disclosed
US-20080081282-A1 RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-04-03 US disclosed
US-4524204-A Process for replacing anions or organic cationic salts EASTMAN KODAK COMPANY (US) 1985-06-18 US disclosed
US-4524204-A Process for replacing anions or organic cationic salts EASTMAN KODAK COMPANY (US) 1985-06-18 US disclosed