SCHEMBL3279385

SCHEMBL3279385

C=CC(=O)NCN(CCCCCC)CCCCCC

nearest known ligand 0.61

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ZDHHC20 Q5W0Z9 2/20 0.61
ZDHHC2 Q9UIJ5 2/20 0.61
FAAH O00519 3/20 0.45
THRA P10827 1/20 0.41
THRB P10828 1/20 0.41
ALDH1A1 P00352 2/20 0.41
TSHR P16473 1/20 0.41
MAPK1 P28482 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
KDM5A P29375 3/20 0.40
PHF8 Q9UPP1 2/20 0.40
KDM4C Q9H3R0 1/20 0.40
EPHX1 P07099 5/20 0.37
ICMT O60725 1/20 0.37
ALB P02768 1/20 0.37
DNM1 Q05193 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11153148 1.00 ZDHHC20 (0.61) ZDHHC20ZDHHC2FAAHTHRATHRB
SCHEMBL3280636 0.98 ZDHHC20 (0.58) ZDHHC20ZDHHC2FAAHTHRATHRB
SCHEMBL3281090 0.93 ZDHHC20 (0.55) ZDHHC20ZDHHC2FAAHTHRATHRB
SCHEMBL4977999 0.90 ZDHHC20 (0.51) ZDHHC20ZDHHC2FAAHTHRATHRB
SCHEMBL28513187 0.86 ZDHHC20 (0.61) ZDHHC20ZDHHC2FAAHTHRATHRB
SCHEMBL3280467 0.85 ZDHHC20 (0.48) ZDHHC20ZDHHC2FAAHTHRATHRB
SCHEMBL2831579 0.85 ZDHHC20 (0.74) ZDHHC20ZDHHC2FAAHTHRATHRB
SCHEMBL3282432 0.85 ZDHHC20 (0.80) ZDHHC20ZDHHC2FAAHALDH1A1KDM5A
SCHEMBL1336641 0.85 ZDHHC20 (0.80) ZDHHC20ZDHHC2FAAHALDH1A1KDM5A
SCHEMBL2830818 0.85 ZDHHC20 (0.69) ZDHHC20ZDHHC2FAAHTHRATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7700540-B2 Hard surface cleaning composition THE CLOROX COMPANY (US) 2010-04-20 US claimed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US claimed
US-7700540-B2 Hard surface cleaning composition THE CLOROX COMPANY (US) 2010-04-20 US disclosed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US disclosed
US-5587279-A HIGH CONCENTRATION OF SILVER CHLORIDE GRAINS FUJI PHOTO FILM CO., LTD. (JP) 1996-12-24 US disclosed
EP-0337490-B1 Silver halide light-sensitive photographic material FUJI PHOTO FILM CO LTD (JP) 1995-12-20 EP disclosed
US-5420004-A Direct positive silver halide emulsion and color diffusion transfer light-sensitive material therewith FUJI PHOTO FILM CO., LTD. (JP) 1995-05-30 US disclosed
US-5104778-A Layer containing anionic dye, cationic polymer mordant, and gelatin FUJI PHOTO FILM CO., LTD. (JP) 1992-04-14 US disclosed
US-5075197-A Water based polymer dispersion FUJI PHOTO FILM CO., LTD. (JP) 1991-12-24 US disclosed
US-4948711-A FIXING SOLUTION CONTAINING A CATIONIC ADDITION POLYMER TO RMOVE IODIDE IONS IN HIGH SPEED CONTINUOUS PROCESSING; EFFICIENCY FUJI PHOTO FILM CO., LTD. (JP) 1990-08-14 US disclosed
US-4933268-A OXONOL DYE HAVING PYRAZOLONE NUCLEUS FUJI PHOTO FILM CO., LTD. (JP) 1990-06-12 US disclosed
EP-0337490-A2 Silver halide light-sensitive photographic material Fuji Photo Film Co., Ltd. (JP) 1989-10-18 EP disclosed
EP-0316013-A2 Silver halide photographic material having at least one dyed hydrophilic colloid layer Fuji Photo Film Co., Ltd. (JP) 1989-05-17 EP disclosed
US-4374924-A CATIONIC POLYMERS COMPRISING QUATERNIZED COPOLYMERS OF P-DIVINYLBENZENE OR A DIACRYLIC ESTER AND AN AMINO-CONTAINING ACRYLIC ESTER OR AMIDE FUJI PHOTO FILM CO., LTD. (JP) 1983-02-22 US disclosed
US-4312940-A FOR ACID DYES; REMOVABLE DURING ALKALINE PROCESSING FUJI PHOTO FILM CO., LTD. (JP) 1982-01-26 US disclosed