SCHEMBL3280600

SCHEMBL3280600

C[C](C)C(CC(C)O)C(CC(C)O)[C](C)C

nearest known ligand 0.39

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
TDP1 Q9NUW8 1/20 0.39
ALDH1A1 P00352 2/20 0.37
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL524531 0.73
SCHEMBL37585 0.73
SCHEMBL42873 0.73
SCHEMBL12559536 0.73
SCHEMBL840436 0.73
SCHEMBL42294 0.73
SCHEMBL8374861 0.73
SCHEMBL3284954 0.73 TSHR (0.39) TSHRTDP1ALDH1A1LMNA
SCHEMBL9652821 0.70
SCHEMBL7095654 0.70 TSHR (0.50) TSHRTDP1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7705115-B2 Process for producing radiation-sensitive resin composition JSR CORPORATION (JP) 2010-04-27 US disclosed
US-20090081586-A1 PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-03-26 US disclosed
EP-1881371-A1 PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-01-23 EP disclosed