⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17558048 | 0.80 | — | — | |
| SCHEMBL1259641 | 0.74 | — | — | |
| SCHEMBL18335388 | 0.74 | — | — | |
| SCHEMBL7693368 | 0.74 | — | — | |
| SCHEMBL285044 | 0.71 | — | — | |
| SCHEMBL20548 | 0.71 | — | — | |
| SCHEMBL15845079 | 0.71 | ALDH1A1 (0.50) | — | |
| SCHEMBL217230 | 0.68 | — | — | |
| SCHEMBL11707110 | 0.67 | ALDH1A1 (0.33) | — | |
| SCHEMBL6767991 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7705115-B2 | Process for producing radiation-sensitive resin composition | JSR CORPORATION (JP) | 2010-04-27 | — | — | US | disclosed |
| US-20090081586-A1 | PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| EP-1881371-A1 | PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-01-23 | — | — | EP | disclosed |