SCHEMBL3280716

SCHEMBL3280716

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nearest known ligand 0.40

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.40
TDP1 Q9NUW8 1/20 0.33
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3281513 0.77 TSHR (0.32) TSHR
SCHEMBL3284954 0.73 TSHR (0.39) TSHRTDP1ALDH1A1
SCHEMBL29017099 0.69
SCHEMBL3287765 0.69 TSHR (0.32) TSHR
SCHEMBL37585 0.67
SCHEMBL42294 0.67
SCHEMBL42873 0.67
SCHEMBL840436 0.67
SCHEMBL12559536 0.67
SCHEMBL524531 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7705115-B2 Process for producing radiation-sensitive resin composition JSR CORPORATION (JP) 2010-04-27 US disclosed
US-20090081586-A1 PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-03-26 US disclosed
EP-1881371-A1 PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-01-23 EP disclosed