Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.54 |
| ▸ | BID | P55957 | 3/20 | 0.46 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.46 |
| ▸ | BCL2L1 | Q07817 | 2/20 | 0.46 |
| ▸ | BAK1 | Q16611 | 2/20 | 0.46 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.46 |
| ▸ | PPARA | Q07869 | 2/20 | 0.46 |
| ▸ | PPARG | P37231 | 1/20 | 0.46 |
| ▸ | EP300 | Q09472 | 1/20 | 0.46 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.46 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.46 |
| ▸ | KAT5 | Q92993 | 1/20 | 0.46 |
| ▸ | SAE1 | Q9UBE0 | 1/20 | 0.46 |
| ▸ | THRA | P10827 | 1/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | RECQL | P46063 | 1/20 | 0.45 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.45 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.45 |
| ▸ | CYSLTR2 | Q9NS75 | 5/20 | 0.44 |
| ▸ | CYSLTR1 | Q9Y271 | 5/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26334 | 1.00 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL23704 | 1.00 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL5010341 | 1.00 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL149532 | 1.00 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL158973 | 1.00 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL6151813 | 1.00 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL15204418 | 1.00 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL41072 | 1.00 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL21121138 | 1.00 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 | |
| SCHEMBL886897 | 1.00 | LIPG (0.54) | LIPGBIDMCL1BCL2L1BAK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250230358-A1 | COMPOSITION, METHOD FOR TREATING OBJECT TO BE TREATED, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2025-07-17 | — | — | US | disclosed |
| EP-4358117-B1 | CLEANING COMPOSITION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | FUJIFILM CORP (JP) | 2025-07-02 | — | — | EP | disclosed |
| CN-117397010-B | Cleaning composition, method for cleaning semiconductor substrate, and method for manufacturing semiconductor element | 富士胶片株式会社 | 2024-07-19 | — | — | CN | disclosed |
| CN-118207032-A | Composite high-base number metal detergent and preparation process thereof | 江苏澳润新材料有限公司 | 2024-06-18 | — | — | CN | disclosed |
| EP-4358117-A1 | CLEANING COMPOSITION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | FUJIFILM Corporation (JP) | 2024-04-24 | — | — | EP | disclosed |
| WO-2024048241-A1 | COMPOSITION, METHOD FOR TREATING OBJECT TO BE TREATED, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE | 富士フイルム株式会社 | 2024-03-07 | — | — | WO | disclosed |
| US-20240067901-A1 | CLEANING COMPOSITION, CLEANING METHOD OF SEMICONDUCTOR SUBSTRATE, AND MANUFACTURING METHOD OF SEMICONDUCTOR ELEMENT | FUJIFILM CORPORATION (JP) | 2024-02-29 | — | — | US | disclosed |
| CN-117397010-A | Cleaning composition, method for cleaning semiconductor substrate, and method for manufacturing semiconductor element | 富士胶片株式会社 | 2024-01-12 | — | — | CN | disclosed |
| WO-2022264869-A1 | CLEANING COMPOSITION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | 富士フイルム株式会社 | 2022-12-22 | — | — | WO | disclosed |
| US-11130095-B1 | Sterilization exhaust gas treating system and method for treating ethylene oxide-containing sterilization exhaust gas by using the same | Chio Kang Medical, Inc. (US) | 2021-09-28 | — | — | US | disclosed |
| EP-0521488-B1 | Esterification process | UNION CARBIDE CHEM PLASTIC (US) | 1996-01-31 | — | — | EP | disclosed |
| US-5308823-A | Low molecular weight substance dispersed in polymer matrix, clarity, opacity | RICOH CO., LTD. (JP) | 1994-05-03 | — | — | US | disclosed |
| US-5231222-A | C8-20 alkylbenzenesulfonic acid catalyst | UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) | 1993-07-27 | — | — | US | disclosed |
| EP-0521488-A2 | Esterification process | UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) | 1993-01-07 | — | — | EP | disclosed |
| US-5116803-A | Optical recording material with resin matrix layer | RICOH COMPANY, LTD. (JP) | 1992-05-26 | — | — | US | disclosed |
| US-4977030-A | FORMING IMAGE OR ERASING DEPENDENT ON TEMPERATURE | RICOH CO., LTD. (JP) | 1990-12-11 | — | — | US | disclosed |
| EP-0139560-A1 | Aqueous composition for dispersing hydrophobic substances,in particular suitable for cleaning objects soiled by paint or the like | SOCIETE NATIONALE ELF AQUITAINE (FR) | 1985-05-02 | — | — | EP | disclosed |
| US-4310471-A | SURFACTANTS | EXXON RESEARCH & ENGINEERING CO. (US) | 1982-01-12 | — | — | US | disclosed |
| US-4226805-A | Sulfonation of oils | WITCO CHEMICAL CORPORATION (US) | 1980-10-07 | — | — | US | disclosed |
| US-4145302-A | DETERGENT-CONTAINING CLEANSING ARTICLE | ATLANTIC RICHFIELD COMPANY (US) | 1979-03-20 | — | — | US | disclosed |