SCHEMBL328596

SCHEMBL328596

C=C(C)C(=O)OC1(CCC)CCCC1

nearest known ligand 0.37

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.37
ALDH1A1 P00352 2/20 0.34
THRB P10828 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12520852 0.98 TSHR (0.36) TSHRALDH1A1THRB
SCHEMBL1397278 0.98 TSHR (0.36) TSHRALDH1A1THRB
SCHEMBL16018490 0.98 TSHR (0.36) TSHRALDH1A1THRB
SCHEMBL457006 0.93 TSHR (0.39) TSHRALDH1A1THRB
SCHEMBL21332849 0.91 ALDH1A1 (0.38) TSHRALDH1A1THRB
SCHEMBL4401688 0.90 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL21338913 0.89 ALDH1A1 (0.37) TSHRALDH1A1THRB
SCHEMBL22772600 0.89 ALDH1A1 (0.37) TSHRALDH1A1THRB
SCHEMBL21332436 0.89 ALDH1A1 (0.37) TSHRALDH1A1THRB
SCHEMBL15284478 0.88 TSHR (0.45) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112980549-B High viscosity index comb polymer viscosity modifiers and methods of using the same to alter lubricant viscosity 英菲诺姆国际有限公司 2023-12-15 CN disclosed
EP-3839018-B1 HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME INFINEUM INT LTD (GB) 2023-10-18 EP disclosed
EP-3839019-B1 HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME INFINEUM INT LTD (GB) 2023-08-02 EP disclosed
US-11685874-B2 High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same INFINEUM INTERNATIONAL LIMITED (GB) 2023-06-27 US disclosed
US-11384311-B2 High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same INFINEUM INTERNATIONAL LIMITED (GB) 2022-07-12 US disclosed
US-11365273-B2 High viscosity index comb polymer viscosity modifiers and methods of modifying lubricant viscosity using same INFINEUM INTERNATIONAL LIMITED (GB) 2022-06-21 US disclosed
US-20220169947-A1 High Viscosity Index Comb Polymer Viscosity Modifiers and Methods of Modifying Lubricant Viscosity Using Same INFINEUM INTERNATIONAL LIMITED (GB) 2022-06-02 US disclosed
US-20210189281-A1 High Viscosity Index Comb Polymer Viscosity Modifiers and Methods of Modifying Lubricant Viscosity Using Same lnfineum International Limited (GB) 2021-06-24 US disclosed
EP-3839017-A1 HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME Infineum International Limited (GB) 2021-06-23 EP disclosed
EP-3839018-A1 HIGH VISCOSITY INDEX COMB POLYMER VISCOSITY MODIFIERS AND METHODS OF MODIFYING LUBRICANT VISCOSITY USING SAME Infineum International Limited (GB) 2021-06-23 EP disclosed
US-20100151380-A1 RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-17 US disclosed
US-20100136481-A1 RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-03 US disclosed
US-20100136481-A1 RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-03 US disclosed
US-20100062365-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-03-11 US disclosed
US-20100010129-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-01-14 US disclosed
US-7575850-B2 Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-08-18 US disclosed
US-7566522-B2 Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-07-28 US disclosed
US-20080193874-A1 Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-08-14 US disclosed
US-20080166660-A1 Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-07-10 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed