SCHEMBL3286240

SCHEMBL3286240

CCCCC(COCC)C(=O)O

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 7/20 0.61
MAPK1 P28482 1/20 0.61
SLC1A2 P43004 2/20 0.52
SLC1A1 P43005 2/20 0.52
SLC1A3 P43003 1/20 0.52
CHRM1 P11229 1/20 0.46
AKR1A1 P14550 1/20 0.46
CHRM3 P20309 1/20 0.46
HTR2A P28223 1/20 0.46
HTR2C P28335 1/20 0.46
ADRA1A P35348 1/20 0.46
HRH1 P35367 1/20 0.46
DRD3 P35462 1/20 0.46
SLC6A3 Q01959 1/20 0.46
HDAC1 Q13547 1/20 0.46
HDAC2 Q92769 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
GRIK1 P39086 2/20 0.46
GRIK2 Q13002 2/20 0.46
CA1 P00915 4/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2357289 0.94 CA2 (0.53) CA2MAPK1SLC1A2SLC1A1SLC1A3
SCHEMBL9335547 0.92 GRIK1 (0.54) CA2MAPK1SLC1A2SLC1A1SLC1A3
SCHEMBL9423046 0.92 CA2 (0.65) CA2MAPK1SLC1A2SLC1A1SLC1A3
SCHEMBL2245789 0.88 CHRM1 (0.62) CA2MAPK1SLC1A2SLC1A1SLC1A3
SCHEMBL3284430 0.86 CA2 (0.59) CA2MAPK1SLC1A2SLC1A1SLC1A3
SCHEMBL3288965 0.86 CA2 (0.59) CA2MAPK1SLC1A2SLC1A1SLC1A3
2-Ethylhexanoic Acid SCHEMBL19857577 0.84 CA2 (0.80) CA2MAPK1SLC1A2SLC1A1SLC1A3
SCHEMBL3280839 0.84 GRIK1 (0.58) CA2MAPK1SLC1A2SLC1A1SLC1A3
SCHEMBL3285291 0.84 GRIK1 (0.58) CA2MAPK1SLC1A2SLC1A1SLC1A3
SCHEMBL20210531 0.83 CA2 (0.41) CA2MAPK1SLC1A2SLC1A1SLC1A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0261775-B1 BINDER COMPOSITIONS CONTAINING PHENOLIC RESINS AND ESTERS OF ALKOXY ACIDS ACME RESIN CORPORATION (US) 1992-06-24 EP claimed
CN-101236356-B Photoresist composition, thin film patterning method using the same, and method of fabricating liquid crystal display using the same SAMSUNG ELECTRONICS CO LTD 2012-11-21 CN disclosed
US-7713677-B2 Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-05-11 US disclosed
CN-101236356-A Photoresist composition, thin film patterning method using the same, and method of fabricating liquid crystal display using the same SAMSUNG ELECTRONICS CO LTD (KR) 2008-08-06 CN disclosed
US-20070190454-A1 PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE SAME, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-08-16 US disclosed
US-7163643-B2 Driving electrolyte and electrolytic capacitor using the same MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-01-16 US disclosed