SCHEMBL3287472

SCHEMBL3287472

C1=CCC([Co]C2C=Cc3ccccc32)=C1

nearest known ligand 0.31

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 2/20 0.31
KDM4E B2RXH2 1/20 0.30
LMNA P02545 1/20 0.30
TP53 P04637 1/20 0.30
CHRM2 P08172 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2D6 P10635 1/20 0.30
CHRM1 P11229 1/20 0.30
DRD2 P14416 1/20 0.30
ADRA2B P18089 1/20 0.30
ADRA2C P18825 1/20 0.30
NFKB1 P19838 1/20 0.30
CHRM3 P20309 1/20 0.30
SLC6A2 P23975 1/20 0.30
HTR2A P28223 1/20 0.30
HTR2C P28335 1/20 0.30
ADRA1A P35348 1/20 0.30
HRH1 P35367 1/20 0.30
DRD3 P35462 1/20 0.30
THPO P40225 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3289267 0.73
SCHEMBL3293688 0.69 HTR2A (0.40) SIGMAR1KDM4ELMNATP53CHRM2
SCHEMBL1080492 0.69 SIGMAR1 (0.33) SIGMAR1HTR2A
SCHEMBL6918915 0.69
SCHEMBL28978247 0.68 SIGMAR1 (0.32) SIGMAR1HTR2A
Hydrochloric Acid SCHEMBL395474 0.68
Iodide SCHEMBL7929231 0.68
SCHEMBL4577791 0.68
Bromide SCHEMBL7933859 0.68 HTR2A (0.32) HTR2A
SCHEMBL7931165 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7718228-B2 Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same JSR CORPORATION (JP) 2010-05-18 US claimed
US-7718228-B2 Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same JSR CORPORATION (JP) 2010-05-18 US disclosed
US-20090022891-A1 METHOD OF FORMING METAL FILM JSR CORPORATION (JP) 2009-01-22 US disclosed
EP-1995347-A1 METHOD OF FORMING METAL FILM JSR Corporation (JP) 2008-11-26 EP disclosed
US-20070077742-A1 Composition for forming silicon-cobalt film, silicon-cobalt film and method forming same JSR CORPORATION (JP) 2007-04-05 US disclosed