Carbon Monoxide

Carbon Monoxide

SCHEMBL3290543

CC1=C([Co]C2=C(C)C=CC2)CC=C1.[C]=O.[C]=O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL515381 0.93
SCHEMBL3287962 0.74
Carbon Monoxide SCHEMBL1426599 0.73
SCHEMBL4165724 0.69
Carbon Monoxide SCHEMBL4622207 0.68
Carbon Monoxide SCHEMBL10605970 0.68
Carbon Monoxide SCHEMBL10605859 0.68
Carbon Monoxide SCHEMBL6552540 0.68
Carbon Monoxide SCHEMBL4948062 0.68
Carbon Monoxide SCHEMBL7650325 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7718228-B2 Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same JSR CORPORATION (JP) 2010-05-18 US claimed
US-7718228-B2 Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same JSR CORPORATION (JP) 2010-05-18 US disclosed
US-20090022891-A1 METHOD OF FORMING METAL FILM JSR CORPORATION (JP) 2009-01-22 US disclosed
EP-1995347-A1 METHOD OF FORMING METAL FILM JSR Corporation (JP) 2008-11-26 EP disclosed
US-20070077742-A1 Composition for forming silicon-cobalt film, silicon-cobalt film and method forming same JSR CORPORATION (JP) 2007-04-05 US disclosed