⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Carbon Monoxide SCHEMBL3290543 | 0.93 | — | — | |
| SCHEMBL3287962 | 0.80 | — | — | |
| SCHEMBL4165724 | 0.74 | — | — | |
| SCHEMBL4373815 | 0.69 | — | — | |
| SCHEMBL8162371 | 0.67 | — | — | |
| SCHEMBL4576960 | 0.67 | — | — | |
| Iodide SCHEMBL1539638 | 0.67 | — | — | |
| Hydrochloric Acid SCHEMBL1539625 | 0.67 | — | — | |
| Fluoride Ion SCHEMBL1539666 | 0.67 | — | — | |
| Bromide SCHEMBL1539631 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113179639-B | Method for converting monoisocyanates to urea | 陶氏环球技术有限责任公司 | 2024-07-12 | — | — | CN | claimed |
| US-20240218503-A1 | SELECTIVE COBALT DEPOSITION ON COPPER SURFACES | APPLIED MATERIALS, INC. | 2024-07-04 | — | — | US | claimed |
| WO-2024137272-A1 | METHOD OF REDUCING METAL GATE RESISTANCE FOR NEXT GENERATION NMOS DEVICE APPLICATION | APPLIED MATERIALS, INC. (US) | 2024-06-27 | — | — | WO | claimed |
| US-20240204061-A1 | METHOD OF REDUCING METAL GATE RESISTANCE FOR NEXT GENERATION NMOS DEVICE APPLICATION | APPLIED MATERIALS, INC. | 2024-06-20 | — | — | US | claimed |
| US-11959167-B2 | Selective cobalt deposition on copper surfaces | APPLIED MATERIALS, INC. (US) | 2024-04-16 | — | — | US | claimed |
| US-20220298625-A1 | SELECTIVE COBALT DEPOSITION ON COPPER SURFACES | APPLIED MATERIALS, INC. | 2022-09-22 | — | — | US | claimed |
| US-11384429-B2 | Selective cobalt deposition on copper surfaces | APPLIED MATERIALS, INC. (US) | 2022-07-12 | — | — | US | claimed |
| CN-113179639-A | Process for converting monoisocyanates into ureas | 陶氏环球技术有限责任公司 | 2021-07-27 | — | — | CN | claimed |
| WO-2021041593-A1 | SELECTIVE COBALT DEPOSITION ON COPPER SURFACES | APPLIED MATERIALS, INC. (US) | 2021-03-04 | — | — | WO | claimed |
| US-20210062330-A1 | SELECTIVE COBALT DEPOSITION ON COPPER SURFACES | APPLIED MATERIALS, INC. | 2021-03-04 | — | — | US | claimed |
| US-20090142474-A1 | RUTHENIUM AS AN UNDERLAYER FOR TUNGSTEN FILM DEPOSITION | APPLIED MATERIALS, INC. | 2009-06-04 | — | — | US | claimed |
| US-20080274279-A1 | NOBLE METAL LAYER FORMATION FOR COPPER FILM DEPOSITION | APPLIED MATERIALS, INC. | 2008-11-06 | — | — | US | claimed |
| US-20080268635-A1 | PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN COPPER CONTACT APPLICATIONS | APPLIED MATERIALS, INC. | 2008-10-30 | — | — | US | claimed |
| US-7404985-B2 | Noble metal layer formation for copper film deposition | APPLIED MATERIALS, INC. (US) | 2008-07-29 | — | — | US | claimed |
| US-20070259111-A1 | METHOD AND APPARATUS FOR PHOTO-EXCITATION OF CHEMICALS FOR ATOMIC LAYER DEPOSITION OF DIELECTRIC FILM | APPLIED MATERIALS, INC. | 2007-11-08 | — | — | US | claimed |
| WO-2007121249-A2 | PROCESS FOR FORMING COBALT-CONTAINING MATERIALS | APPLIED MATERIALS, INC. (US) | 2007-10-25 | — | — | WO | claimed |
| US-20070202254-A1 | PROCESS FOR FORMING COBALT-CONTAINING MATERIALS | APPLIED MATERIALS, INC. | 2007-08-30 | — | — | US | claimed |
| US-20050220998-A1 | Noble metal layer formation for copper film deposition | APPLIED MATERIALS, INC. | 2005-10-06 | — | — | US | claimed |
| US-5403620-A | Catalysis in organometallic CVD of thin metal films | REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 1995-04-04 | — | — | US | claimed |
| US-5130172-A | Coating on a substrate a metal, exposure and vaporization and reaction with hydrogenation | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 1992-07-14 | — | — | US | claimed |