SCHEMBL329203

SCHEMBL329203

CCN(CC)[Si](C)(C)N(CC)CC

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16280166 0.85
SCHEMBL1448901 0.83 HTT (0.32) HTT
SCHEMBL2104186 0.82
SCHEMBL17553085 0.79
SCHEMBL16280017 0.79
SCHEMBL16284827 0.79
SCHEMBL10025651 0.77
SCHEMBL24494616 0.77
SCHEMBL22589349 0.77
SCHEMBL9845415 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 577 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12421603-B2 Composition for high temperature atomic layer deposition of high quality silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2025-09-23 US claimed
CN-119900018-A Composition for high temperature atomic layer deposition of high quality silicon oxide films 弗萨姆材料美国有限责任公司 2025-04-29 CN claimed
CN-119372625-A Process and apparatus for radical enhanced vapor deposition ASM IP私人控股有限公司 2025-01-28 CN claimed
US-20250029831-A1 PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION ASM IP HOLDING B.V. (NL) 2025-01-23 US claimed
US-11649547-B2 Deposition of carbon doped silicon oxide VERSUM MATERIALS US, LLC (US) 2023-05-16 US claimed
US-11631580-B2 Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials VERSUM MATERIALS US, LLC (US) 2023-04-18 US claimed
US-20230068883-A1 A MOISTURE-CURABLE SILICONE ELASTOMER COMPOSITION WACKER CHEMIE AG (DE) 2023-03-02 US claimed
CN-110573651-B Formulations for depositing silicon doped hafnium oxide as ferroelectric material 弗萨姆材料美国有限责任公司 2022-07-22 CN claimed
US-20220189767-A1 FORMULATION FOR DEPOSITION OF SILICON DOPED HAFNIUM OXIDE AS FERROELECTRIC MATERIALS VERSUM MATERIALS US, LLC (US) 2022-06-16 US claimed
US-20210363639-A1 COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS VERSUM MATERIALS US, LLC (US) 2021-11-25 US claimed
US-6875243-B2 Catalysts for preparing polyisocyanates containing isocyanurate groups, and their use DEGUSSA AG (DE) 2005-04-05 US claimed
US-20030135007-A1 Catalysts for preparing polyisocyanates containing isocyanurate groups, and their use DEGUSSA AG (DE) 2003-07-17 US claimed
US-20030109665-A1 Catalysts for preparing polyisocyanates containing isocyanurate groups, and their use DEGUSSA AG (DE) 2003-06-12 US claimed
EP-1318160-A1 Catalysts and process for the preparation of isocyanurate group containing polyisocyanates and their use Degussa AG (DE) 2003-06-11 EP claimed
EP-1318152-A2 Catalysts and process for preparing polyisocyanates containing isocyanurate groups and their use Degussa AG (DE) 2003-06-11 EP claimed
US-6034188-A Process for preparing polyolefins NIPPON OIL COMPANY, LIMITED (JP) 2000-03-07 US claimed
EP-0431409-B1 A nonaqueous method for making silicone polymers GEN ELECTRIC (US) 1996-06-12 EP claimed
EP-0431409-A2 A nonaqueous method for making silicone polymers GENERAL ELECTRIC COMPANY (US) 1991-06-12 EP claimed
US-4950779-A Nonaqueous method for making silicone oligomers GENERAL ELECTRIC COMPANY (US) 1990-08-21 US claimed
US-4412073-A Isocyanurate preparation by catalytic, aminosilyl initiated cyclotrimerization of isocyanates RHONE-POULENC SPECIALITES CHIMIQUES (FR) 1983-10-25 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11649547-B2 Deposition of carbon doped silicon oxide ESRRG, ESRRB, DNMT3B HTT 4729/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.