SCHEMBL3294273

SCHEMBL3294273

CCCC(C)C1(C(=O)O)CCCCC1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM1 P11229 1/20 0.35
AKR1A1 P14550 1/20 0.35
CHRM3 P20309 1/20 0.35
HTR2A P28223 1/20 0.35
HTR2C P28335 1/20 0.35
ADRA1A P35348 1/20 0.35
HRH1 P35367 1/20 0.35
DRD3 P35462 1/20 0.35
SLC6A3 Q01959 1/20 0.35
HDAC1 Q13547 1/20 0.35
HDAC2 Q92769 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CYP2C19 P33261 1/20 0.35
MME P08473 5/20 0.34
TSHR P16473 2/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
CYP3A4 P08684 2/20 0.31
KDM4E B2RXH2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1469950 0.84 CHRM1 (0.38) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL11387148 0.81 CHRM1 (0.35) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL14576719 0.77 CA2 (0.36) CHRM1AKR1A1CHRM3HTR2AHTR2C
SCHEMBL14032755 0.76 CYP2C19 (0.38) ADRA1ATDP1CYP2C19MMETSHR
SCHEMBL2862907 0.74 CYP2C19 (0.38) CYP2C19MMETSHRSMN1; SMN2ALDH1A1
SCHEMBL11301399 0.74 CYP2C19 (0.38) CYP2C19MMETSHRSMN1; SMN2ALDH1A1
SCHEMBL5513287 0.74 CYP2C19 (0.38) CYP2C19MMETSHRSMN1; SMN2ALDH1A1
SCHEMBL5509879 0.74 CYP2C19 (0.38) CYP2C19MMETSHRSMN1; SMN2ALDH1A1
SCHEMBL13875771 0.74 CA2 (0.37) CYP2C19MEN1KMT2A
SCHEMBL7438181 0.74 CA2 (0.37) CYP2C19MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7736708-B2 Micropattern retardation element NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2010-06-15 US disclosed
US-20070134442-A1 Micropattern retardation element NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2007-06-14 US disclosed
US-20040213923-A1 Process for preparing positive-negative blended optical retardation film, positive-negative blended optical retardation film, and liquid crystal display element and liquid crystal display device using the same NATIONAL CHIAO TUNG UNIVERSITY, TAIWAN, R.O.C. 2004-10-28 US disclosed
US-20040201797-A1 Process for preparing positive-negative blended optical retardation film, positive-negative blended optical retardation film, and liquid crystal display element and liquid crystal display device using the same NATIONAL CHIAO TUNG UNIVERSITY (TW) 2004-10-14 US disclosed
US-4957640-A Corrosion prevention with compositions prepared from organic fatty amines and nitrogen-containing aromatic heterocyclic compounds THE DOW CHEMICAL COMPANY (US) 1990-09-18 US disclosed
US-4765839-A PAVING THE DOW CHEMICAL COMPANY (US) 1988-08-23 US disclosed
US-4761473-A CORROSION RESISTANCE OF OIL OR GAS WELLS THE DOW CHEMICAL COMPANY (US) 1988-08-02 US disclosed