Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.33 |
| ▸ | GRIN2A | Q12879 | 4/20 | 0.33 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.33 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.33 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.33 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.33 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.33 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.33 |
| ▸ | MTOR | P42345 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16708432 | 0.89 | ALDH1A1 (0.33) | — | |
| SCHEMBL6370850 | 0.85 | EPHX2 (0.33) | MEN1KMT2AGRIN1GRIN2AGRIN2D | |
| SCHEMBL5901133 | 0.83 | ALDH1A1 (0.33) | — | |
| SCHEMBL5901482 | 0.82 | — | — | |
| SCHEMBL1218938 | 0.82 | — | — | |
| SCHEMBL3680710 | 0.80 | CYP17A1 (0.32) | MEN1KMT2A | |
| SCHEMBL16708433 | 0.80 | — | — | |
| SCHEMBL16708435 | 0.80 | — | — | |
| SCHEMBL15281488 | 0.80 | CYP17A1 (0.36) | MEN1KMT2ALMNAEPHX2 | |
| SCHEMBL172055 | 0.80 | CYP17A1 (0.36) | MEN1KMT2ALMNAEPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8530134-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2013-09-10 | — | — | US | disclosed |
| US-20100297551-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-7816471-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-10-19 | — | — | US | disclosed |
| US-20100099836-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | WATANABE HITOSHI | 2010-04-22 | — | — | US | disclosed |
| US-7662897-B2 | dropping polymerization of monomers such as 1-hydroxy-3-methacryloyloxyadamantane (HMA), 5-methacryloyloxy-2,6-norbornane carbolactone (MNBL), 2-methacryloyloxy-2-methyladamantane (2-MMA), solvent extraction, redissolving, desolventing; purification; metal-free | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-16 | — | — | US | disclosed |
| US-7655743-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-02 | — | — | US | disclosed |
| US-20080268377-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | WATANABE HITOSHI | 2008-10-30 | — | — | US | disclosed |
| EP-1491560-B1 | PROCESS FOR THE PRODUCTION OF HIGH-MOLECULAR COMPOUNDS FOR PHOTORESIST | DAICEL CHEM (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20060116494-A1 | Process for producing photoresist polymeric compounds | WATANABE HITOSHI | 2006-06-01 | — | — | US | disclosed |
| US-20060116493-A1 | Process for producing photoresist polymeric compounds | WATANABE HITOSHI | 2006-06-01 | — | — | US | disclosed |
| US-7015291-B2 | Process for the production of high-molecular compounds for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-21 | — | — | US | disclosed |
| US-20050100815-A1 | Process for the production of high-molecular compounds for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-05-12 | — | — | US | disclosed |