SCHEMBL3308281

SCHEMBL3308281

BOCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL28466121 0.95
Fluoride SCHEMBL14976804 0.95
Butane SCHEMBL1268678 0.91
SCHEMBL21927809 0.69
SCHEMBL10027733 0.67
SCHEMBL2613136 0.67
SCHEMBL16005479 0.67
Ether SCHEMBL659815 0.67
Butane SCHEMBL584030 0.63
SCHEMBL20481782 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115385941-A Fluoroboropyrrole derivative and preparation method and application thereof 广东工业大学 2022-11-25 CN claimed
CN-113172974-A Biaxially oriented degradable film and preparation method thereof 海南赛诺实业有限公司 2021-07-27 CN claimed
CN-108409784-B Preparation method of phosphorus chiral important intermediate 上海交通大学 2020-07-14 CN claimed
US-4496699-A COORDINATION CATALYST CONTAINING CHROMIUM TRIOXIDE, ORGANOPHOSPHOROUS COMPOUND, AND ORGANOBORANE COMPOUND NATIONAL DISTILLERS AND CHEMICAL CORPORATION (US) 1985-01-29 US claimed
US-4379075-A Process for polymerizing high melt index olefins and polymerization catalysts used therefore NATIONAL PETRO CHEMICALS CORP. (US) 1983-04-05 US claimed
CN-112526822-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2025-02-28 CN disclosed
CN-112286000-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-12-03 CN disclosed
CN-118620392-A Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-09-10 CN disclosed
CN-114660896-B Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound 信越化学工业株式会社 2024-06-11 CN disclosed
CN-111458980-B Composition for forming underlayer film of silicon-containing resist and method for forming pattern 信越化学工业株式会社 2023-08-11 CN disclosed
US-20230159529-A1 AROMATIC COMPOUND AND APPLICATION THEREOF IN ANTITUMOR DRUG SHANGHAI ZHEYE BIOTECHNOLOGY CO., LTD. (CN) 2023-05-25 US disclosed
CN-111094317-B Phosphonic acid derivative with CD73 inhibitory activity, and preparation method and application thereof 上海和誉生物医药科技有限公司 2023-03-31 CN disclosed
CN-1052465-C Sol-gel composition for producing glassy coatings BRITISH TECH GROUP (GB) 2000-05-17 CN disclosed
CN-1116421-A Sol-gel composition for making transparent coating BRITISH TECH GROUP (GB) 1996-02-07 CN disclosed
EP-0506892-A4 BORONATED NUCLEOSIDES 1993-03-31 EP disclosed
EP-0506892-A1 BORONATED NUCLEOSIDES. BORON BIOLOG INC (US) 1992-10-07 EP disclosed
WO-1991009048-A1 BORONATED NUCLEOSIDES BARON BIOLOGICALS, INC. (US) 1991-06-27 WO disclosed
WO-1988004601-A1 WOOD PRESERVATIVES LAPORTE INDUSTRIES LIMITED (GB) 1988-06-30 WO disclosed
EP-0089812-B1 N-SUBSTITUTED PSEUDO-AMINOSUGARS, THEIR PRODUCTION AND USE Takeda Chemical Industries, Ltd. (JP) 1986-10-01 EP disclosed
US-4381345-A Pretreatment of glucose feedstock with reducing agents UOP INC. (US) 1983-04-26 US disclosed