Tetramethylammonium Ion

Tetramethylammonium Ion

SCHEMBL330911

CCCCCCCCCCCCc1ccccc1S(=O)(=O)[O-].C[N+](C)(C)C

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LIPG Q9Y5X9 1/20 0.50
NR1H2 P55055 1/20 0.42
NR1H3 Q13133 1/20 0.42
KCNH2 Q12809 6/20 0.40
BID P55957 3/20 0.40
MCL1 Q07820 3/20 0.40
BCL2L1 Q07817 2/20 0.40
BAK1 Q16611 2/20 0.40
KAT8 Q9H7Z6 2/20 0.40
PPARG P37231 1/20 0.40
PPARA Q07869 1/20 0.40
EP300 Q09472 1/20 0.40
KAT2A Q92830 1/20 0.40
KAT2B Q92831 1/20 0.40
KAT5 Q92993 1/20 0.40
SAE1 Q9UBE0 1/20 0.40
THRA P10827 1/20 0.40
THRB P10828 1/20 0.40
RECQL P46063 1/20 0.39
CYSLTR2 Q9NS75 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16895142 0.95 LIPG (0.54) LIPGNR1H2NR1H3KCNH2BID
Potassium Ion SCHEMBL21822103 0.94 LIPG (0.53) LIPGNR1H2NR1H3KCNH2BID
Lithium Ion SCHEMBL21822107 0.94 LIPG (0.53) LIPGNR1H2NR1H3KCNH2BID
Lithium Ion SCHEMBL21822101 0.94 LIPG (0.53) LIPGNR1H2NR1H3KCNH2BID
Lithium Ion SCHEMBL21822090 0.94 LIPG (0.53) LIPGNR1H2NR1H3KCNH2BID
Potassium Ion SCHEMBL23749193 0.94 LIPG (0.53) LIPGNR1H2NR1H3KCNH2BID
Lithium Ion SCHEMBL21822093 0.94 LIPG (0.53) LIPGNR1H2NR1H3KCNH2BID
Lithium Ion SCHEMBL21822088 0.94 LIPG (0.53) LIPGNR1H2NR1H3KCNH2BID
Lithium Ion SCHEMBL21822174 0.94 LIPG (0.53) LIPGNR1H2NR1H3KCNH2BID
Lithium Ion SCHEMBL21822091 0.94 LIPG (0.53) LIPGNR1H2NR1H3KCNH2BID

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1892285-B1 Cleaning composition, cleaning method, and manufacturing method of semiconductor device JSR CORP (JP) 2010-01-06 EP claimed
EP-1892285-A2 Cleaning composition, cleaning method, and manufacturing method of semiconductor device JSR Corporation (JP) 2008-02-27 EP claimed
US-20080045016-A1 CLEANING COMPOSITION, CLEANING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2008-02-21 US claimed
US-20210179940-A1 WIDE TEMPERATURE RANGE AND HIGH PHOTOCHEMICAL STABILITY SMECTIC LIQUID CRYSTAL COMPOSITIONS WITH A MONOLAYER SMECTIC A PHASE (SMA1), METHOD OF OBTAINING THEREOF AND DEVICES UTILIZING THEREOF WOJSKOWA AKADEMIA TECHNICZNA (PL) 2021-06-17 US disclosed
EP-3704213-A1 WIDE TEMPERATURE RANGE AND HIGH PHOTOCHEMICAL STABILITY SMECTIC LIQUID CRYSTAL COMPOSITIONS WITH A MONOLAYER SMECTIC A PHASE (SMA1), METHOD OF OBTAINING THEREOF AND DEVICES UTILIZING THEREOF Wojskowa Akademia Techniczna (PL) 2020-09-09 EP disclosed
EP-2295484-B1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2018-01-17 EP disclosed
EP-2407498-B1 Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material MITSUI CHEMICALS INC (JP) 2017-11-15 EP disclosed
US-8304507-B2 Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material MITSUI CHEMICALS, INC. (JP) 2012-11-06 US disclosed
EP-2407498-A2 Polymerizable composition for polythiourethane optical material, polythiourethane optical material obtained from the polymerizable composition, and polymerization catalyst for polythiourethane optical material Mitsui Chemicals, Inc. (JP) 2012-01-18 EP disclosed
US-20110112269-A1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM THE POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2011-05-12 US disclosed
EP-2295484-A1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL, POLYTHIOURETHANE OPTICAL MATERIAL OBTAINED FROM SAME POLYMERIZABLE COMPOSITION, AND POLYMERIZATION CATALYST FOR POLYTHIOURETHANE OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2011-03-16 EP disclosed
EP-1892285-B1 Cleaning composition, cleaning method, and manufacturing method of semiconductor device JSR CORP (JP) 2010-01-06 EP disclosed
EP-1892285-A2 Cleaning composition, cleaning method, and manufacturing method of semiconductor device JSR Corporation (JP) 2008-02-27 EP disclosed
US-20080045016-A1 CLEANING COMPOSITION, CLEANING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2008-02-21 US disclosed
EP-0914364-B1 SCRATCH-RESISTANT ANTI-FOG COATING COMPOSITION INCORPORATING ISOCYANATE-REACTIVE SURFACTANTS FILM SPECIALTIES INC (US) 2006-12-20 EP disclosed
EP-0914364-A4 SCRATCH-RESISTANT ANTI-FOG COATING COMPOSITION INCORPORATING ISOCYANATE-REACTIVE SURFACTANTS FILM SPECIALTIES INC (US) 1999-09-29 EP disclosed
EP-0914364-A1 SCRATCH-RESISTANT ANTI-FOG COATING COMPOSITION INCORPORATING ISOCYANATE-REACTIVE SURFACTANTS FILM SPECIALTIES, INC. (US) 1999-05-12 EP disclosed
US-5877254-A Scratch-resistant anti-fog coating composition incorporating isocyanate-reactive surfactants FILM SPECIALTIES, INC. (US) 1999-03-02 US disclosed
WO-1998003575-A1 SCRATCH-RESISTANT ANTI-FOG COATING COMPOSITION INCORPORATING ISOCYANATE-REACTIVE SURFACTANTS FILM SPECIALTIES, INC. (US) 1998-01-29 WO disclosed