SCHEMBL3310031

SCHEMBL3310031

CC(O)CC1CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9897850 0.97 CTSK (0.40)
SCHEMBL9819752 0.97 CTSK (0.40)
SCHEMBL16855279 0.97 CTSK (0.40)
SCHEMBL13718823 0.97 CTSK (0.40)
SCHEMBL1037969 0.97 CTSK (0.40)
SCHEMBL6660560 0.97 CTSK (0.40)
SCHEMBL9819946 0.94
SCHEMBL9167927 0.88 TSHR (0.37)
SCHEMBL9819705 0.88
SCHEMBL14386678 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110294972-A A kind of ink 深圳TCL工业研究院有限公司 2019-10-01 CN claimed
EP-2648675-A1 HAIR RELAXING AND STRAIGHTENING COMPOSITIONS International Flora Technologies, Ltd. (US) 2013-10-16 EP claimed
US-20120148517-A1 Hair Relaxing and Straightening Compositions INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) 2012-06-14 US claimed
WO-2012078658-A1 HAIR RELAXING AND STRAIGHTENING COMPOSITIONS INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) 2012-06-14 WO claimed
US-20240427248-A1 RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2024-12-26 US disclosed
US-20230032354-A1 METHOD FOR FORMING PHOTORESIST PATTERNS SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-02-02 US disclosed
US-20230024422-A1 RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2023-01-26 US disclosed
US-20230028244-A1 RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION SAMSUNG SDI CO., LTD. (KR) 2023-01-26 US disclosed
CN-112931539-B Rice composite insect-resist agent and preparation method and application thereof 中南粮油食品科学研究院有限公司 2022-03-04 CN disclosed
CN-112931539-A Rice composite insect-resist agent and preparation method and application thereof 中南粮油食品科学研究院有限公司 2021-06-11 CN disclosed
CN-110294972-A A kind of ink 深圳TCL工业研究院有限公司 2019-10-01 CN disclosed
EP-2471774-B1 Piperidinyl derivatives as modulators of chemokine receptor activity BRISTOL MYERS SQUIBB CO (US) 2016-08-24 EP disclosed
EP-2648675-A1 HAIR RELAXING AND STRAIGHTENING COMPOSITIONS International Flora Technologies, Ltd. (US) 2013-10-16 EP disclosed
US-8497062-B2 Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method JSR CORPORATION (JP) 2013-07-30 US disclosed
WO-2012078658-A1 HAIR RELAXING AND STRAIGHTENING COMPOSITIONS INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) 2012-06-14 WO disclosed
US-20120148517-A1 Hair Relaxing and Straightening Compositions INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) 2012-06-14 US disclosed
US-20100112475-A1 RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, AND RESIST PATTERN FORMATION METHOD JSR CORPORATION (JP) 2010-05-06 US disclosed
EP-0832153-B1 BENZOATES AS FLAME RETARDANTS GREAT LAKES CHEMICAL CORP (US) 2003-07-02 EP disclosed
US-4987132-A PLATELET ACTIVATING FACTOR ANTAGONISTS YAMANOUCHI PHARMACEUTICAL CO., LTD. (JP) 1991-01-22 US disclosed
EP-0279681-A2 Saturated heterocyclic carboxamide derivatives YAMANOUCHI PHARMACEUTICAL CO. LTD. (JP) 1988-08-24 EP disclosed