SCHEMBL33109

SCHEMBL33109

CCCCCOC(=O)C(C)O

nearest known ligand 0.64

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.54
EPHX1 P07099 1/20 0.50
TSHR P16473 3/20 0.48
ALDH1A1 P00352 1/20 0.48
HCAR2 Q8TDS4 2/20 0.47
TP53 P04637 1/20 0.46
CYP3A4 P08684 1/20 0.46
MAPK1 P28482 1/20 0.46
MAPT P10636 1/20 0.46
RAD52 P43351 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
ATM Q13315 1/20 0.45
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA9 Q16790 1/20 0.45
FAAH O00519 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12646415 0.98 NAAA (0.57) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL12334711 0.98 NAAA (0.57) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL1276448 0.98 NAAA (0.57) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL22396606 0.98 NAAA (0.57) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL22396614 0.98 NAAA (0.57) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL505594 0.98 NAAA (0.57) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL9271282 0.98 NAAA (0.57) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL17461292 0.98 NAAA (0.57) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL4735966 0.98 NAAA (0.57) NAAAEPHX1TSHRALDH1A1HCAR2
SCHEMBL1067454 0.98 NAAA (0.57) NAAAEPHX1TSHRALDH1A1HCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 5502 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260144726-A1 POLYOL-FREE COSMETIC COMPOSITION COMPRISING ALPHA HYDROXY ACID ESTER L'OREAL (FR) 2026-05-28 US claimed
US-12585186-B2 Photoacid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-24 US claimed
US-20260050214-A1 MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-19 US claimed
US-12535733-B2 Molecular resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-01-27 US claimed
EP-4619826-A1 THICK FILM CHEMICALLY AMPLIFIED POSITIVE TYPE RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME Merck Patent GmbH (DE) 2025-09-24 EP claimed
US-20250282807-A1 PROCESS FOR ISOLATION AND/OR PURIFYING OF GLYCOLIPIDS AMPHISTAR (BE) 2025-09-11 US claimed
CN-120118238-A Narrow-band luminous microsphere and preparation method thereof 海南大学 2025-06-10 CN claimed
CN-115991815-B Halogenated modified prepared photoresist resin material and preparation method thereof 中国科学院长春应用化学研究所 2025-03-07 CN claimed
CN-119552136-A Preparation method of 5-hydroxymethylfurfural aqueous solution 中国科学院大连化学物理研究所 2025-03-04 CN claimed
CN-119552135-A Preparation method of 5-hydroxymethylfurfural aqueous solution based on intermittent reaction 中国科学院大连化学物理研究所 2025-03-04 CN claimed
WO-1998000505-A1 CLEAR, COLORLESS SOAP BAR WITH SUPERIOR MILDNESS, LATHERING AND DISCOLORATION RESISTANCE JOHNSON & JOHNSON CONSUMER PRODUCTS, INC. (US) 1998-01-08 WO claimed
WO-1997041094-A1 ACYLOXYALKANE SULFONATE AND AMPHOTERIC SURFACTANT BLEND COMPOSITIONS AND METHODS FOR PREPARING SAME RHONE-POULENC SURFACTANTS AND SPECIALTIES, L.P. (US) 1997-11-06 WO claimed
WO-1997041095-A1 N-ACYL AMINOALKANE SULFONATE AND AMPHOTERIC SURFACTANT BLENDS AND METHODS FOR PREPARING THE SAME RHONE-POULENC SURFACTANTS AND SPECIALTIES, L.P. (US) 1997-11-06 WO claimed
WO-1997024053-A1 WASHING SYSTEM UNILEVER PLC (GB) 1997-07-10 WO claimed
CN-1146213-A Skin cleansing composition UNILEVER PLC (NL) 1997-03-26 CN claimed
US-5415810-A Fatty acyl isethionate LEVER BROTHERS COMPANY, DIVISION OF CONOPCO, INC. (US) 1995-05-16 US claimed
US-4929533-A Using light sensitive diazo resin and high molecular weight copolymer FUJI PHOTO FILM CO., LTD. (JP) 1990-05-29 US claimed
EP-0049422-B1 STABLE NONAQUEOUS SOLUTION OF TETRACYCLINE SALT MILES LABORATORIES, INC. (US) 1986-01-29 EP claimed
US-4376118-A Stable nonaqueous solution of tetracycline salt MILES LABORATORIES, INC. (US) 1983-03-08 US claimed
US-4062312-A Method for deforming and coating a metallic surface ASTRO CONTAINERS, INC. (US) 1977-12-13 US claimed