⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6671419 | 0.74 | — | — | |
| SCHEMBL216024 | 0.74 | — | — | |
| SCHEMBL7942464 | 0.74 | — | — | |
| SCHEMBL9796482 | 0.67 | — | — | |
| SCHEMBL332166 | 0.65 | — | — | |
| SCHEMBL3212597 | 0.64 | — | — | |
| SCHEMBL25205866 | 0.62 | — | — | |
| SCHEMBL25205913 | 0.62 | — | — | |
| SCHEMBL8385626 | 0.61 | — | — | |
| SCHEMBL8741707 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025228854-A1 | NOVEL SILICON COMPOUNDS, METHOD OF PRODUCING THE SAME, AND METHOD OF DEPOSITING A SILICON-CONTAINING THIN FILMS BY USING THE SAME | MERCK PATENT GMBH (DE) | 2025-11-06 | — | — | WO | disclosed |
| US-20120114544-A1 | ORGANIC CHLOROHYDROSILANE AND METHOD FOR PREPARING THEM | SAMSUNG FINE CHEMICALS CO., LTD (KR) | 2012-05-10 | — | — | US | disclosed |
| US-8097745-B2 | Method of producing organosilicon compound | JSR CORPORATION (JP) | 2012-01-17 | — | — | US | disclosed |
| US-20110082309-A1 | METHOD OF PRODUCING ORGANOSILICON COMPOUND | JSR CORPORATION (JP) | 2011-04-07 | — | — | US | disclosed |
| EP-1428795-B1 | SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF | CHISSO CORP (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-7449539-B2 | Silsesquioxane derivative and production process for the same | CHISSO CORPORATION (JP) | 2008-11-11 | — | — | US | disclosed |
| US-20070032454-A1 | Silsesquioxane derivative and production process for the same | JNC CORPORATION (JP) | 2007-02-08 | — | — | US | disclosed |
| US-7169873-B2 | Silsesquioxane derivatives and process for production thereof | CHISSO CORPORATION (JP) | 2007-01-30 | — | — | US | disclosed |
| US-20040249103-A1 | Silsesquioxane derivatives and process for production thereof | JNC CORPORATION (JP) | 2004-12-09 | — | — | US | disclosed |
| EP-0969007-B1 | Method of making an aromatic chlorosilane compound by a hydrosilation reaction | DOW CORNING ASIA LTD (JP) | 2004-09-22 | — | — | EP | disclosed |
| EP-1428795-A1 | SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF | CHISSO CORPORATION (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-6251057-B1 | FORMING SILICON-CARBON BONDS FOR USE IN ORGANOSILICON COMPOUNDS SYNTHESIS; ACTIVATED ALKYL HALIDES AND UNACTIVATED ALKYL HALIDES | KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2001-06-26 | — | — | US | disclosed |
| US-6054602-A | Method of making an aromatic chlorosilane compound by a hydrosilation reaction | DOW CORNING ASIA, LTD. (JP) | 2000-04-25 | — | — | US | disclosed |
| EP-0969007-A2 | Method of making an aromatic chlorosilane compound by a hydrosilation reaction | Dow Corning Asia, Ltd. (JP) | 2000-01-05 | — | — | EP | disclosed |
| US-5399740-A | Tris(silyl)methanes and their preparation methods | KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 1995-03-21 | — | — | US | disclosed |