SCHEMBL331467

SCHEMBL331467

SC1(S)CCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL566284 1.00
SCHEMBL10012794 1.00
SCHEMBL11823863 1.00
SCHEMBL10012480 1.00
SCHEMBL3020424 1.00
SCHEMBL3014410 0.95
SCHEMBL5687816 0.80
SCHEMBL10011146 0.80
Hydrogen Sulfide SCHEMBL9333951 0.76
SCHEMBL4262604 0.67 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1330 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4423165-B1 A POLYMER BEING SUITABLE AS INERT COMPONENT OF A RADIATION CURING COATING AND IN PARTICULAR OF A RADIATION CURING INK HUBERGROUP DEUTSCHLAND GMBH (DE) 2025-09-24 EP claimed
US-20250034320-A1 A polymer being suitable as inert component of a radiation curing coating and in particular of a radiation curing ink HUBERGROUP DEUTSCHLAND GMBH (DE) 2025-01-30 US claimed
EP-3581600-B1 RESIN LENS AND PREPARATION METHOD THEREFOR EFIRM NEW MAT CO LTD (CN) 2025-01-08 EP claimed
CN-118943397-A Cathode catalyst layer and membrane electrode of proton exchange membrane fuel cell 华北电力大学 2024-11-12 CN claimed
EP-4423165-A1 A POLYMER BEING SUITABLE AS INERT COMPONENT OF A RADIATION CURING COATING AND IN PARTICULAR OF A RADIATION CURING INK hubergroup Deutschland GmbH (DE) 2024-09-04 EP claimed
CN-118206718-A Core-shell material and preparation method thereof 华为技术有限公司 2024-06-18 CN claimed
CN-117567274-A Preparation method of colorless high-purity pentaerythritol tetraoctanoate 广东聚石科技研究院有限公司 2024-02-20 CN claimed
US-11888096-B2 Quantum dot formulations with thiol-based crosslinkers for UV-LED curing APPLIED MATERIALS, INC. (US) 2024-01-30 US claimed
CN-117362566-A High-refractive-index composite material, and preparation method and application thereof 益丰新材料股份有限公司 2024-01-09 CN claimed
CN-116948127-A Preparation method of optical resin lens 益丰新材料股份有限公司 2023-10-27 CN claimed
CN-106916436-A Transparent plastic substrate and plastic lens 豪雅镜片泰国有限公司 2017-07-04 CN claimed
WO-2017025244-A1 COSMETIC PROCESS FOR TREATING KERATIN MATERIALS L'OREAL (FR) 2017-02-16 WO claimed
WO-2016050788-A1 COSMETIC PROCESS FOR ATTENUATING WRINKLES L'OREAL (FR) 2016-04-07 WO claimed
WO-2016050786-A1 COSMETIC PROCESS FOR ATTENUATING WRINKLES L'OREAL (FR) 2016-04-07 WO claimed
EP-1968936-B1 PROCESS AND CATALYST FOR SYNTHESIS OF MERCAPTANS AND SULFIDES FROM ALCOHOLS CHEVRON PHILLIPS CHEMICAL CO (US) 2015-05-06 EP claimed
US-8633292-B2 Polyurethane-based photochromic optical materials Signet Armorlite (US) 2014-01-21 US claimed
EP-2411848-A1 PLYURETHANE-BASED PHOTOCHROMIC OPTICAL MATERIALS Signet Armorlite Inc. (US) 2012-02-01 EP claimed
WO-2010110917-A1 PLYURETHANE-BASED PHOTOCHROMIC OPTICAL MATERIALS SIGNET ARMORLITE INC. (US) 2010-09-30 WO claimed
US-20100249264-A1 Polyurethane-based photochromic optical materials SIGNET ARMORLITE, INC. 2010-09-30 US claimed
US-6117923-A OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-09-12 US claimed