SCHEMBL3316396

SCHEMBL3316396

CCO[Si](CCC=C(C)C(=O)O)(OCC)OCC

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CD81 P60033 1/20 0.33
PPARG P37231 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23413056 1.00 CD81 (0.33) CD81PPARG
SCHEMBL291059 0.89 EP300 (0.34) CD81
SCHEMBL291057 0.89 EP300 (0.34) CD81
Hydrogen Sulfide SCHEMBL465804 0.88 EP300 (0.33) CD81
Hydrogen Sulfide SCHEMBL28929437 0.86 EP300 (0.36) CD81
SCHEMBL16243909 0.84 CD81 (0.33) CD81PPARG
SCHEMBL16243759 0.83 ALDH1A1 (0.36) CD81
SCHEMBL16243652 0.82 CD81 (0.32) CD81
SCHEMBL28968589 0.81
SCHEMBL1218931 0.81 APEX1 (0.35) CD81PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4065616-B1 POLYMER CONETWORKS OF POLY(PYRIDINE-(METH)-ACRYLAMIDE) DERIVATIVES-CROSSLINKED BY TRANSITION METAL IONS- AND LINKED BY POLYDIMETHYLSILOXANE DERIVATIVES LUXEMBOURG INST SCIENCE & TECH LIST (LU) 2023-08-23 EP claimed
WO-2023097383-A1 OMNIPHILIC HYBRID RESIN COMPOSITION FOR ADDITIVE MANUFACTURE OF MEDICAL DEVICES, METHOD FOR PRODUCING SAID RESIN AND USE THEREOF UNIVERSIDADE ESTADUAL DE CAMPINAS (BR) 2023-06-08 WO claimed
US-20230008301-A1 POLYMER CONETWORKS OF POLY(PYRIDINE-(METH)-ACRYLAMIDE) DERIVATIVES- CROSSLINKED BY TRANSITION METAL IONS-AND LINKED BY POLYDIMETHYLSILOXANE DERIVATIVES LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST) (LU) 2023-01-12 US claimed
EP-4065616-A1 POLYMER CONETWORKS OF POLY(PYRIDINE-(METH)-ACRYLAMIDE) DERIVATIVES-CROSSLINKED BY TRANSITION METAL IONS- AND LINKED BY POLYDIMETHYLSILOXANE DERIVATIVES Luxembourg Institute of Science and Technology (LIST) (LU) 2022-10-05 EP claimed
WO-2021105349-A1 POLYMER CONETWORKS OF POLY(PYRIDINE-(METH)-ACRYLAMIDE) DERIVATIVES-CROSSLINKED BY TRANSITION METAL IONS- AND LINKED BY POLYDIMETHYLSILOXANE DERIVATIVES LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST) (LU) 2021-06-03 WO claimed
EP-4065616-B1 POLYMER CONETWORKS OF POLY(PYRIDINE-(METH)-ACRYLAMIDE) DERIVATIVES-CROSSLINKED BY TRANSITION METAL IONS- AND LINKED BY POLYDIMETHYLSILOXANE DERIVATIVES LUXEMBOURG INST SCIENCE & TECH LIST (LU) 2023-08-23 EP disclosed
WO-2023097383-A1 OMNIPHILIC HYBRID RESIN COMPOSITION FOR ADDITIVE MANUFACTURE OF MEDICAL DEVICES, METHOD FOR PRODUCING SAID RESIN AND USE THEREOF UNIVERSIDADE ESTADUAL DE CAMPINAS (BR) 2023-06-08 WO disclosed
US-20230008301-A1 POLYMER CONETWORKS OF POLY(PYRIDINE-(METH)-ACRYLAMIDE) DERIVATIVES- CROSSLINKED BY TRANSITION METAL IONS-AND LINKED BY POLYDIMETHYLSILOXANE DERIVATIVES LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST) (LU) 2023-01-12 US disclosed
EP-4065616-A1 POLYMER CONETWORKS OF POLY(PYRIDINE-(METH)-ACRYLAMIDE) DERIVATIVES-CROSSLINKED BY TRANSITION METAL IONS- AND LINKED BY POLYDIMETHYLSILOXANE DERIVATIVES Luxembourg Institute of Science and Technology (LIST) (LU) 2022-10-05 EP disclosed
WO-2021105349-A1 POLYMER CONETWORKS OF POLY(PYRIDINE-(METH)-ACRYLAMIDE) DERIVATIVES-CROSSLINKED BY TRANSITION METAL IONS- AND LINKED BY POLYDIMETHYLSILOXANE DERIVATIVES LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST) (LU) 2021-06-03 WO disclosed
US-9177819-B2 Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPORATION (JP) 2015-11-03 US disclosed
US-20140349485-A1 METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE TOKUYAMA CORPORATION a corporation 2014-11-27 US disclosed
US-8642991-B2 Photosensitive quantum dot, composition comprising the same and method of forming quantum dot-containing pattern using the composition SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-02-04 US disclosed
US-20100117110-A1 Photosensitive Quantum Dot, Composition Comprising the Same and Method of Forming Quantum Dot-Containing Pattern Using the Composition SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-05-13 US disclosed