Acetone

Acetone

SCHEMBL3316535

CC(C)=O.COCC(C)O

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.44
MAPK1 P28482 1/20 0.40
MAPT P10636 1/20 0.38
TDP1 Q9NUW8 3/20 0.37
TSHR P16473 3/20 0.34
ALDH1A1 P00352 2/20 0.33
LMNA P02545 2/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
PGR P06401 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM4 P08173 1/20 0.32
HTR1A P08908 1/20 0.32
CHRM5 P08912 1/20 0.32
CHRM1 P11229 1/20 0.32
CHRNB2 P17787 1/20 0.32
CHRM3 P20309 1/20 0.32
TBXA2R P21731 1/20 0.32
CHRNB4 P30926 1/20 0.32
CHRNA3 P32297 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetone SCHEMBL15328259 0.93 HSD17B10 (0.44) HSD17B10MAPK1MAPTTDP1TSHR
Acetic Acid SCHEMBL2772542 0.92 MAPK1 (0.44) HSD17B10MAPK1MAPTTDP1TSHR
Acetic Acid SCHEMBL3255637 0.92 MAPK1 (0.44) HSD17B10MAPK1MAPTTDP1TSHR
Acetic Acid SCHEMBL3249560 0.92 MAPK1 (0.44) HSD17B10MAPK1MAPTTDP1TSHR
Acetic Acid SCHEMBL113972 0.92 MAPK1 (0.44) HSD17B10MAPK1MAPTTDP1TSHR
Acetic Acid SCHEMBL27775662 0.90 MAPK1 (0.42) HSD17B10MAPK1MAPTTDP1TSHR
Acetic Acid Methyl Ester SCHEMBL2046413 0.90 ALDH1A1 (0.50) HSD17B10MAPK1MAPTTDP1TSHR
Bicarbonate SCHEMBL28079320 0.89 HSD17B10 (0.44) HSD17B10MAPK1MAPTTDP1TSHR
SCHEMBL716147 0.88 HSD17B10 (0.52) HSD17B10MAPK1MAPTTDP1TSHR
SCHEMBL76862 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20010009749-A1 Chemically amplified resist NEC CORPORATION 2001-07-26 US claimed
CN-110408331-A Response to temperature adhesive sheet and laminated body LINTEC CORP 2019-11-05 CN disclosed
CN-110256976-A Response to temperature adhesive sheet and laminated body 琳得科株式会社 2019-09-20 CN disclosed
CN-110240870-A Adhesive sheet coiling body 琳得科株式会社 2019-09-17 CN disclosed
CN-110183977-A Adhesive sheet coiling body 琳得科株式会社 2019-08-30 CN disclosed
CN-107107403-B The manufacturing method of internal mold release, the composition comprising the internal mold release and the plastic lens using the composition 三井化学株式会社 2019-04-02 CN disclosed
CN-105992803-B adhesive sheet and laminate 琳得科株式会社 2019-03-08 CN disclosed
CN-103992751-B Pressure-sensitive-adhesive composition, contact adhesive and pressure sensitive adhesion sheet 琳得科株式会社 2019-01-15 CN disclosed
CN-108977097-A Flexible device carrying tablet 琳得科株式会社 2018-12-11 CN disclosed
CN-108884209-A Polymerizable composition for optical material, optical material obtained from the composition, and plastic lens 三井化学株式会社 2018-11-23 CN disclosed
US-20090206520-A1 Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof SAMSUNG ELECTRONICS CO., LTD. 2009-08-20 US disclosed
US-20090073349-A1 THREE-DIMENSIONAL MICROFABRICATION METHOD USING PHOTOSENSITIVE NANOCRYSTALS AND DISPLAY DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-03-19 US disclosed
WO-2007041508-A2 METHOD OF OPTICAL FABRICATION OF THREE-DIMENSIONAL POLYMERIC STRUCTURES WITH OUT OF PLANE PROFILE CONTROL CARNEGIE MELLON UNIVERSITY (US) 2007-04-12 WO disclosed
US-6566036-B2 Comprising polyhydroxystyrene protected by 1-ethoxyethanol, photosensitive acid generator, solvent and polystyrene filler; dimensional and shape control of semiconductors; responsive to design rule of <0.15mu m; miniaturization NEC ELECTRONICS CORPORATION (JP) 2003-05-20 US disclosed
CN-1097065-C Reactive two-component polyurethane compositions and optionally self-healing and scratch-resistant coatings prepared therefrom MINNESOTA MINING & MFG (US) 2002-12-25 CN disclosed
US-20010009749-A1 Chemically amplified resist NEC CORPORATION 2001-07-26 US disclosed
US-5798409-A CURED POLYURETHANE COATING EXHIBIT HIGH DAMPING, EXCELLENT SCRATCH-RESISTANCE; TWO PART REACTIVE MINNESOTA MINING & MANUFACTURING COMPANY (US) 1998-08-25 US disclosed
CN-1159816-A Reactive two-part polyurethane compositions and optionally self-healable and scratch-resistant coatings prepared therefrom MINNESOTA MINING & MFG (US) 1997-09-17 CN disclosed
EP-0784641-A1 REACTIVE TWO-PART POLYURETHANE COMPOSITIONS AND OPTIONALLY SELF-HEALABLE AND SCRATCH-RESISTANT COATINGS PREPARED THEREFROM MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-07-23 EP disclosed
WO-1996010595-A1 REACTIVE TWO-PART POLYURETHANE COMPOSITIONS AND OPTIONALLY SELF-HEALABLE AND SCRATCH-RESISTANT COATINGS PREPARED THEREFROM MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1996-04-11 WO disclosed