Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 2/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL305153 | 0.70 | MAPK1 (0.47) | CA12CA1CA2CA9PKM | |
| SCHEMBL5421810 | 0.69 | MGAM (0.38) | CA12CA1CA2CA9HSD17B10 | |
| Acetic Acid Methyl Ester SCHEMBL11129181 | 0.67 | ALOX15 (0.48) | CA12CA1CA2CA9PKM | |
| SCHEMBL6178193 | 0.66 | CA12 (0.52) | CA12CA1CA2CA9PKM | |
| SCHEMBL11153814 | 0.66 | — | — | |
| SCHEMBL2267201 | 0.65 | CYP19A1 (0.50) | CA12CA1CA2CA9PKM | |
| SCHEMBL4406722 | 0.64 | CA1 (0.50) | CA12CA1CA2CA9PKM | |
| SCHEMBL17075163 | 0.64 | CA1 (0.50) | CA12CA1CA2CA9PKM | |
| SCHEMBL27996645 | 0.64 | — | — | |
| SCHEMBL610682 | 0.64 | CA1 (0.50) | CA12CA1CA2CA9PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11038145-B2 | Laminated film and process for manufacturing the same, as well as method for analyzing laminated film | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-06-15 | — | — | US | disclosed |
| WO-2020116367-A1 | POLYBUTADIENE AND METHOD FOR PRODUCING SAME | 宇部興産株式会社 | 2020-06-11 | — | — | WO | disclosed |
| US-20170288169-A1 | LAMINATED FILM AND PROCESS FOR MANUFACTURING THE SAME, AS WELL AS METHOD FOR ANALYZING LAMINATED FILM | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20170288170-A1 | LAMINATED FILM AND PROCESS FOR MANUFACTURING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9646940-B2 | Gas barrier film and electronic device | Konica Minolta, Inc. (JP) | 2017-05-09 | — | — | US | disclosed |
| US-20160272883-A1 | COATED SEMICONDUCTOR NANOPARTICLE AND METHOD FOR MANUFACTURING THE SAME | Konica Minolta, Inc. (JP) | 2016-09-22 | — | — | US | disclosed |
| EP-3070143-A1 | COATED SEMICONDUCTOR NANOPARTICLE AND METHOD FOR MANUFACTURING THE SAME | Konica Minolta, Inc. (JP) | 2016-09-21 | — | — | EP | disclosed |
| US-20160186009-A1 | GAS BARRIER FILM | Konica Minolta, Inc. (JP) | 2016-06-30 | — | — | US | disclosed |
| US-9359527-B2 | Gas barrier film | Konica Minolta, Inc. (JP) | 2016-06-07 | — | — | US | disclosed |
| US-9362524-B2 | Method for producing gas barrier film, gas barrier film, and electronic device | Konica Minolta, Inc. (JP) | 2016-06-07 | — | — | US | disclosed |
| EP-0887200-B1 | Coating composition for recording material, recording material and process for producing recording material | YUPO CORP (JP) | 2004-09-15 | — | — | EP | disclosed |
| EP-1452549-A1 | PROCESS FOR PRODUCING MODIFIED POLYMER, APPARATUS FOR PRODUCING MODIFIED POLYMER, AND MODIFIED POLYMER | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-09-01 | — | — | EP | disclosed |
| EP-1433809-A1 | Optical member having antireflection film | HOYA CORPORATION (JP) | 2004-06-30 | — | — | EP | disclosed |
| US-6506537-B2 | Photopolymerization | JSR CORPORATION (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-6001165-A | FOR INK JET PRINTERS WHICH ABSORBS INK RAPIDLY, DOES NOT BLOT, WATER RESISTANCE | OJI-YUKA SYNTHETIC PAPER CO., LTD. (JP) | 1999-12-14 | — | — | US | disclosed |
| EP-0887200-A1 | Coating composition for recording material and process for producing recording material | OJI-YUKA SYNTHETIC PAPER CO., LTD. (JP) | 1998-12-30 | — | — | EP | disclosed |
| CN-1203250-A | Coating composition for recording material and process for producing recording material | OJI YUKA SYNT PAPER CO LTD (JP) | 1998-12-30 | — | — | CN | disclosed |
| US-5622784-A | WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM | SEIKO EPSON CORPORATION (JP) | 1997-04-22 | — | — | US | disclosed |