SCHEMBL331996

SCHEMBL331996

C1CC(CC2CCNCC2)CCN1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GBA1 P04062 2/20 0.42
GABRA5 P31644 4/20 0.39
GABRB2 P47870 3/20 0.39
GABRA1 P14867 3/20 0.39
SLC6A1 P30531 2/20 0.39
SLC6A12 P48065 2/20 0.39
SLC6A11 P48066 2/20 0.39
SLC6A13 Q9NSD5 2/20 0.39
GABRA4 P48169 2/20 0.39
GABRR1 P24046 1/20 0.39
HRH3 Q9Y5N1 3/20 0.37
CPN1 P15169 1/20 0.37
CPB2 Q96IY4 1/20 0.37
HRH4 Q9H3N8 1/20 0.37
GNAI3 P08754 1/20 0.35
GNAO1 P09471 1/20 0.35
GNAI1 P63096 1/20 0.35
TSHR P16473 3/20 0.35
GABRG2 P18507 2/20 0.35
GABRB3 P28472 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1241237 0.97 GBA1 (0.41) GBA1GABRA5GABRB2GABRA1SLC6A1
SCHEMBL1692012 0.91 GBA1 (0.38) GBA1GABRA5GABRB2GABRA1SLC6A1
SCHEMBL25570435 0.88 SLC6A1 (0.48) GBA1GABRA5GABRB2GABRA1SLC6A1
SCHEMBL2148995 0.88 EPHX1 (0.37) GBA1GABRA5GABRB2GABRA1SLC6A1
SCHEMBL21940451 0.88 EPHX1 (0.37) GBA1GABRA5GABRB2GABRA1SLC6A1
SCHEMBL8297763 0.88 EPHX1 (0.37) GBA1GABRA5GABRB2GABRA1SLC6A1
Hydrochloric Acid SCHEMBL38665760 0.88 GBA1 (0.37) GBA1GABRA5GABRB2GABRA1SLC6A1
SCHEMBL18930423 0.88 SLC6A1 (0.43) GBA1GABRA5GABRB2GABRA1SLC6A1
SCHEMBL1691658 0.84 MEN1 (0.39) GBA1GABRA5GABRB2GABRA1SLC6A1
SCHEMBL5668144 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 339 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3660069-B1 FAST CURING EPOXY SYSTEMS EVONIK OPERATIONS GMBH (DE) 2024-01-03 EP claimed
EP-3569630-B1 FAST CURING EPOXY SYSTEMS EVONIK OPERATIONS GMBH (DE) 2022-08-03 EP claimed
EP-3569629-B1 FAST CURING EPOXY SYSTEMS EVONIK OPERATIONS GMBH (DE) 2022-07-06 EP claimed
CN-113121796-B Preparation method of low-dielectric silicon amine-epoxy resin copolymer 华中师范大学 2022-04-29 CN claimed
US-20200172723-A1 FAST-CURING EPOXY SYSTEMS EVONIK OPERATIONS GMBH (DE) 2020-06-04 US claimed
EP-3660069-A1 FAST CURING EPOXY SYSTEMS Evonik Operations GmbH (DE) 2020-06-03 EP claimed
US-20190352449-A1 FAST-CURING EPOXY SYSTEMS EVONIK DEGUSSA GMBH (DE) 2019-11-21 US claimed
US-20190352452-A1 FAST-CURING EPOXY SYSTEMS EVONIK DEGUSSA GMBH (DE) 2019-11-21 US claimed
EP-3569629-A1 FAST CURING EPOXY SYSTEMS Evonik Degussa GmbH (DE) 2019-11-20 EP claimed
EP-3569630-A1 FAST CURING EPOXY SYSTEMS Evonik Degussa GmbH (DE) 2019-11-20 EP claimed
EP-2682430-B1 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY KOC SOLUTION CO LTD (KR) 2015-10-21 EP claimed
CN-103108918-B Method for manufacturing resin for thiourethane-based optical material using universal polyisocyanate compound, resin composition, and optical material manufactured thereby KOC SOLUTION CO LTD 2015-07-15 CN claimed
US-20140039145-A1 METHOD OF PRODUCING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING GENERAL-PURPOSE POLYISOCYANATE COMPOUND, RESIN COMPOSITION FOR THIOURETHANE-BASED OPTICAL MATERIAL AND THIOURETHANE-BASED OPTICAL MATERIAL INCLUDING RESIN PRODUCED BY THE METHOD KOC SOLUTION CO LTD (KR) 2014-02-06 US claimed
EP-2682430-A2 METHOD FOR MANUFACTURING RESIN FOR THIOURETHANE-BASED OPTICAL MATERIAL USING UNIVERSAL POLYISOCYANATE COMPOUND, RESIN COMPOSITION, AND OPTICAL MATERIAL MANUFACTURED THEREBY Koc Solution Co.,LTD. (KR) 2014-01-08 EP claimed
EP-4332140-B1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED PRODUCT, AND METHOD OF PRODUCING OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2026-05-27 EP disclosed
EP-4741436-A1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED ARTICLE, AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2026-05-13 EP disclosed
EP-4711395-A2 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, POLYMERIZABLE PREPOLYMER COMPOSITION FOR OPTICAL MATERIAL, CURED PRODUCT, AND METHOD FOR PRODUCING OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2026-03-18 EP disclosed
US-5783079-A INTERFACIAL POLYMERIZATION AT LIQUID-LIQUID INTERFACE USING A MULTIFUNCTIONAL COMPOUND HAVING 2 AMINE FUNCTIONAL GROUPS AND AN ACID HALIDE IN PRESENCE OF INERT PERFLUORO-TERT-AMINE COMPOUND; MEMBRANE USED FOR DESALTING AND WATER TREATMENT TOYO BOSEKI KABUSHIKI KAISHA (JP) 1998-07-21 US disclosed
EP-0785194-A1 Episulfide compound MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1997-07-23 EP disclosed
EP-0761665-A2 Episulfide group containing alkyl sulfide compounds MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1997-03-12 EP disclosed