SCHEMBL3320890

SCHEMBL3320890

Sc1ccccc1S.Sc1ccccc1S.[Ni]

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.43
HDAC8 Q9BY41 1/20 0.43
CYP2A6 P11509 1/20 0.36
ALOX12 P18054 1/20 0.36
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
CDC25B P30305 1/20 0.35
MDM4 O15151 2/20 0.33
TP53 P04637 2/20 0.33
ALDH1A1 P00352 2/20 0.33
IDO1 P14902 2/20 0.33
LMNA P02545 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
PSMD14 O00487 1/20 0.33
COPS5 Q92905 1/20 0.33
KDM4E B2RXH2 1/20 0.33
CES2 O00748 1/20 0.33
APAF1 O14727 1/20 0.33
TERT O14746 1/20 0.33
NPC1 O15118 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3168654 1.00
SCHEMBL3320886 1.00 MAPT (0.43) MAPTHDAC8CYP2A6ALOX12MEN1
SCHEMBL63240 0.95
SCHEMBL16582039 0.95 MAPT (0.45) MAPTHDAC8CYP2A6ALOX12MEN1
SCHEMBL29365040 0.95
Benzene SCHEMBL795031 0.91 MAPT (0.50) MAPTHDAC8ALOX12MDM4TP53
SCHEMBL8609431 0.91
SCHEMBL7853638 0.91 MAPT (0.43) MAPTHDAC8CYP2A6ALOX12MEN1
SCHEMBL1157899 0.91
Ammonia Solution, Strong SCHEMBL4964195 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6573503-B1 Plastic light selective element for imaging applications INTEL CORPORATION 2003-06-03 US claimed
US-6169283-B1 Plastic light selective element for imaging applications INTEL CORPORATION 2001-01-02 US claimed
CN-112424652-A Display element and method for manufacturing display element JSR株式会社 2021-02-26 CN disclosed
US-20100104985-A1 COMPOUND FOR PHOTORESIST, PHOTORESIST LIQUID, AND ETCHING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-04-29 US disclosed
EP-2135901-A1 COMPOUND FOR PHOTORESIST, PHOTORESIST SOLUTION, AND ETCHING METHOD USING THE PHOTORESIST SOLUTION Fujifilm Corporation (JP) 2009-12-23 EP disclosed
US-6623666-B1 Plastic light selective element for imaging applications INTEL CORPORATION 2003-09-23 US disclosed
US-6573503-B1 Plastic light selective element for imaging applications INTEL CORPORATION 2003-06-03 US disclosed
US-6479199-B2 CONTAINING CYANINE DYE KONICA CORPORATION (JP) 2002-11-12 US disclosed
US-20020009665-A1 Processing method of silver halide photographic light sensitive material KONICA CORPORATION (JP) 2002-01-24 US disclosed
US-6169283-B1 Plastic light selective element for imaging applications INTEL CORPORATION 2001-01-02 US disclosed
US-6169280-B1 Light selective element for imaging applications INTEL CORPORATION 2001-01-02 US disclosed
US-6020582-A Light selective element for imaging applications INTEL CORPORATION (US) 2000-02-01 US disclosed
WO-1999050876-A1 LIGHT SELECTIVE ELEMENT FOR IMAGING APPLICATIONS INTEL CORPORATION (US) 1999-10-07 WO disclosed
WO-1997018222-A9 NOVEL OLIGOSACCHARIDE GLYCOSIDES HAVING MAMMALIAN IMMUNOSUPPRESSIVE AND TOLEROGENIC PROPERTIES GLYCOMED INC (US) 1999-07-01 WO disclosed
EP-0587425-B1 Optical recording medium TDK CORP (JP) 1998-02-04 EP disclosed
EP-0452853-B1 Heat-developable color-sensitive material FUJI PHOTO FILM CO LTD (JP) 1998-01-28 EP disclosed
US-5427901-A Has spectral sensitivity characteristics in at least one silver halide emulsion layer which provides superior color separation from other layers having a sensitivity in the infrared region FUJI PHOTO FILM CO., LTD. (JP) 1995-06-27 US disclosed
US-5368988-A Cyclopentadiene metal complex dye quencher TDK CORPORATION (JP) 1994-11-29 US disclosed
EP-0587425-A2 Optical recording medium TDK Corporation (JP) 1994-03-16 EP disclosed
EP-0452853-A1 Heat-developable color-sensitive material Fuji Photo Film Co., Ltd. (JP) 1991-10-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100104985-A1 COMPOUND FOR PHOTORESIST, PHOTORESIST LIQUID, AND ETCHING METHOD USING THE SAME PYCR1, STK10, STK4 MAPT 264/4885HDAC8 3817/4885CYP2A6 4332/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.