Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNN4 | O15554 | 5/20 | 0.67 |
| ▸ | KIF11 | P52732 | 1/20 | 0.40 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | NR3C2 | P08235 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11805262 | 0.80 | KCNN4 (0.67) | KCNN4KIF11TAAR1MAPK1NR3C2 | |
| SCHEMBL2490805 | 0.80 | KCNN4 (1.00) | KCNN4KIF11TAAR1MAPK1NR3C2 | |
| SCHEMBL28798433 | 0.78 | KCNN4 (0.64) | KCNN4KIF11TAAR1MAPK1NR3C2 | |
| SCHEMBL469181 | 0.78 | KCNN4 (0.64) | KCNN4KIF11TAAR1MAPK1NR3C2 | |
| Hydrochloric Acid SCHEMBL9957339 | 0.76 | KCNN4 (0.61) | KCNN4KIF11TAAR1MAPK1NR3C2 | |
| SCHEMBL27948873 | 0.76 | KCNN4 (0.61) | KCNN4KIF11TAAR1MAPK1NR3C2 | |
| SCHEMBL8142427 | 0.76 | KCNN4 (0.61) | KCNN4KIF11ALDH1A1CYP2C19HIF1A | |
| SCHEMBL19027907 | 0.76 | KCNN4 (0.61) | KCNN4KIF11TAAR1MAPK1NR3C2 | |
| Bromide SCHEMBL28232025 | 0.76 | KCNN4 (0.61) | KCNN4KIF11TAAR1MAPK1NR3C2 | |
| SCHEMBL22558396 | 0.75 | KCNN4 (0.59) | KCNN4KIF11TAAR1MAPK1NR3C2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8445178-B2 | Composition for radical polymerization and method of forming pattern using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-05-21 | — | — | US | disclosed |
| US-20100119976-A1 | COMPOSITION FOR RADICAL POLYMERIZATION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-05-13 | — | — | US | disclosed |