SCHEMBL3326322

SCHEMBL3326322

CC(=O)OC(=O)C=O.[Ti]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6969987 0.97
Water SCHEMBL28759526 0.94
Acetic Acid SCHEMBL27667309 0.92 ALDH1A1 (0.47)
Methoxymethane SCHEMBL27695850 0.92 ALDH1A1 (0.47)
Acetic Acid Methyl Ester SCHEMBL27850394 0.89 ALDH1A1 (0.53)
Acetic Acid Methyl Ester SCHEMBL27850393 0.80 ALDH1A1 (0.56)
Acetic Acid SCHEMBL27667308 0.79 FFAR3 (0.44)
SCHEMBL7611159 0.77
SCHEMBL7848633 0.76 ALDH1A1 (0.43)
SCHEMBL7848630 0.76 ALDH1A1 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2131423-B1 NEGATIVE ELECTRODE BASE MEMBER TOKYO OHKA KOGYO CO LTD (JP) 2017-11-15 EP disclosed
US-9105929-B2 Negative electrode base member TOKYO OHKA KOGYO CO., LTD. (JP) 2015-08-11 US disclosed
US-8927147-B2 Negative electrode base member KANTO GAKUIN SCHOOL CORPORATION (JP) 2015-01-06 US disclosed
EP-2472655-B1 Negative electrode base member TOKYO OHKA KOGYO CO LTD (JP) 2014-03-12 EP disclosed
US-8551651-B2 Secondary cell having negative electrode base member TOKYO OHKA KOGYO CO., LTD. (JP) 2013-10-08 US disclosed
US-20130252098-A1 NEGATIVE ELECTRODE BASE MEMBER KANTO GAKUIN UNIVERSITY SURFACE ENGINEERING RESEARCH INSTITUTE (JP) 2013-09-26 US disclosed
US-20130252099-A1 NEGATIVE ELECTRODE BASE MEMBER KANTO GAKUIN UNIVERSITY SURFACE ENGINEERING RESEARCH INSTITUTE (JP) 2013-09-26 US disclosed
EP-2472655-A1 Negative electrode base member Tokyo Ohka Kogyo Co., Ltd. (JP) 2012-07-04 EP disclosed
US-7723430-B2 Thin film having interpenetrating network layer and method for manufacturing the thin film RIKEN (JP) 2010-05-25 US disclosed
US-20100119939-A1 NEGATIVE ELECTRODE BASE MEMBER TOKYO OHKA KOGYO CO., LTD. (JP) 2010-05-13 US disclosed
EP-2131423-A1 NEGATIVE ELECTRODE BASE MEMBER Tokyo Ohka Kogyo Co., Ltd. (JP) 2009-12-09 EP disclosed
US-20090098353-A1 Thin Film Having Interpenetrating Network Layer and Method for Manufacturing the Thin Film RIKEN (JP) 2009-04-16 US disclosed
EP-1978054-A1 THIN FILM HAVING INTERPENETRATING POLYMER NETWORK LAYER AND METHOD FOR PRODUCTION THEREOF Riken (JP) 2008-10-08 EP disclosed
US-20070126147-A1 Method of producing a nanomaterial, and a nanomaterial RIKEN (JP) 2007-06-07 US disclosed