4-Vinylphenol

4-Vinylphenol

SCHEMBL3329424

C=Cc1ccc(O)cc1.C=Cc1ccc(OC(=O)OC(C)(C)C)cc1

nearest known ligand 0.55

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 6/20 0.55
MIF P14174 2/20 0.44
KDM1A O60341 1/20 0.42
BCHE P06276 2/20 0.38
HIF1A Q16665 1/20 0.38
EPAS1 Q99814 1/20 0.38
OGA O60502 1/20 0.37
CA2 P00918 1/20 0.36
MAPT P10636 4/20 0.36
KMT2A Q03164 4/20 0.36
MEN1 O00255 3/20 0.36
RAB9A P51151 2/20 0.36
ALDH1A1 P00352 2/20 0.36
P4HB P07237 1/20 0.36
CALM1 P0DP23 1/20 0.36
F3 P13726 1/20 0.36
XDH P47989 1/20 0.36
KDM4E B2RXH2 2/20 0.35
NPC1 O15118 1/20 0.35
LMNA P02545 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL220773 0.94 ELANE (0.62) ELANEMIFKDM1AHIF1AEPAS1
4-Vinylphenol SCHEMBL1506659 0.93 ELANE (0.49) ELANEMIFKDM1ABCHEHIF1A
4-Vinylphenol SCHEMBL2474027 0.89 ELANE (0.45) ELANEMIFKDM1ABCHEHIF1A
4-Vinylphenol SCHEMBL6674720 0.88 ELANE (0.44) ELANEMIFKDM1ABCHEHIF1A
SCHEMBL4057059 0.87 ELANE (0.70) ELANEMIFKDM1ACA2MAPT
SCHEMBL8518510 0.87 ELANE (0.54) ELANEMIFKDM1AHIF1AEPAS1
4-Vinylphenol SCHEMBL31324625 0.86 MIF (0.48) ELANEMIFHIF1AEPAS1CA2
SCHEMBL3329422 0.85 ELANE (0.55) ELANEMIFKDM1ABCHECA2
4-Vinylphenol SCHEMBL7702861 0.85 ELANE (0.41) ELANEMIFKDM1ABCHEHIF1A
SCHEMBL8521546 0.84 ELANE (0.40) ELANEMIFKDM1ABCHEHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100136477-A1 Photosensitive Composition AZ ELECTRONIC MATERIALS USA CORP. 2010-06-03 US disclosed
US-20080187868-A1 Photoactive Compounds AZ ELECTRONIC MATERIALS USA CORP. 2008-08-07 US disclosed
EP-0780732-A2 Polymer composition and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-06-25 EP disclosed
US-5350660-A Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1994-09-27 US disclosed
US-5240812-A Overcoating with thin film of polymer impermeable to vapors of bases INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1993-08-31 US disclosed
EP-0440374-A2 Chemical amplified resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1991-08-07 EP disclosed