Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 3/20 | 0.55 |
| ▸ | STAT3 | P40763 | 1/20 | 0.50 |
| ▸ | APP | P05067 | 1/20 | 0.47 |
| ▸ | MIF | P14174 | 1/20 | 0.44 |
| ▸ | BCHE | P06276 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 4/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | P4HB | P07237 | 1/20 | 0.42 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | F3 | P13726 | 1/20 | 0.42 |
| ▸ | XDH | P47989 | 1/20 | 0.42 |
| ▸ | KDM1A | O60341 | 1/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | TYR | P14679 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3838392 | 0.90 | ELANE (0.46) | ELANESTAT3APPMIFBCHE | |
| SCHEMBL2474025 | 0.88 | ELANE (0.44) | ELANESTAT3APPMIFBCHE | |
| SCHEMBL4057059 | 0.87 | ELANE (0.70) | ELANEMIFMAPTKDM4EMEN1 | |
| 4-Vinylphenol SCHEMBL3329424 | 0.85 | ELANE (0.55) | ELANEMIFBCHEMAPTALDH1A1 | |
| SCHEMBL8767557 | 0.84 | ELANE (0.40) | ELANESTAT3APPMIFBCHE | |
| SCHEMBL8521546 | 0.84 | ELANE (0.40) | ELANESTAT3APPMIFBCHE | |
| SCHEMBL3843081 | 0.80 | KDM1A (0.39) | ELANESTAT3MIFBCHEMAPT | |
| SCHEMBL6843705 | 0.80 | ELANE (0.38) | ELANESTAT3APPMIFBCHE | |
| SCHEMBL7708633 | 0.80 | ELANE (0.66) | ELANEMIFMAPTALDH1A1KDM4E | |
| SCHEMBL4928930 | 0.80 | THRB (0.58) | ELANEMAPTALDH1A1KDM4EMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100136477-A1 | Photosensitive Composition | AZ ELECTRONIC MATERIALS USA CORP. | 2010-06-03 | — | — | US | disclosed |
| US-20080187868-A1 | Photoactive Compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2008-08-07 | — | — | US | disclosed |
| EP-1038890-B1 | Dendritic polymers and their preparation | SHINETSU CHEMICAL CO (JP) | 2005-01-26 | — | — | EP | disclosed |
| EP-1039346-B1 | Resist compositions and pattering process | SHINETSU CHEMICAL CO (JP) | 2004-05-26 | — | — | EP | disclosed |
| US-6686121-B2 | WITHOUT PURIFYING RESIST MATERIALS FORMED BY REACTION, BY REACTING AN ALKALI-SOLUBLE POLYMER HAVING PHENOLIC HYDROXYL GROUPS OR CARBOXYL GROUP WITH A VINYL ETHER AND/OR DIALKYL CARBONATE IN CATALYST, APROTIC SOLVENT, ADDING ACID GENERATOR | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-02-03 | — | — | US | disclosed |
| EP-0942329-B1 | NOVEL PROCESS FOR PREPARING RESISTS | CLARIANT FINANCE BVI LTD (VG) | 2002-11-13 | — | — | EP | disclosed |
| US-6455223-B1 | COMPOSITION COMPRISING AS BASE RESIN DENDRITIC OR HYPERBRANCHED POLYMER OF PHENOL DERIVATIVE HAVING SPECIFIED WEIGHT AVERAGE MOLECULAR WEIGHT; HIGH RESOLUTION, HIGH SENSITIVITY, MINIMIZED LINE EDGE ROUGHNESS, ETCH RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-09-24 | — | — | US | disclosed |
| US-6414101-B1 | DENDRITIC OR HYPERBRANCHED POLYMER OF HYDROXYSTYRENE DERIVATIVE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-07-02 | — | — | US | disclosed |
| US-20010024765-A1 | Novel process for preparing resists | MERCK PATENT GMBH (DE) | 2001-09-27 | — | — | US | disclosed |
| EP-0814381-B1 | Positive image forming composition | FUJI PHOTO FILM CO LTD (JP) | 2001-09-19 | — | — | EP | disclosed |
| US-5679500-A | FORMING RESIST FILM BY USING A CHEMICAL AMPLIFICATION RESIST WHICH GENERATES AN ACID IN RESPONSE TO LASER LIGHT AND WHICH REACTS WITH THE ACID | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| US-5658711-A | FORMING RESIST FILM CONTAINING BASE GENERATOR, GENERATING BASE BY RADIATION, FORMING METAL OXIDE FILM, ETCHING | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1997-08-19 | — | — | US | disclosed |
| EP-0440374-B1 | Chemical amplified resist material | WAKO PURE CHEM IND LTD (JP) | 1997-04-16 | — | — | EP | disclosed |
| EP-0691674-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1996-01-10 | — | — | EP | disclosed |
| US-5468589-A | Heat resistant, photosensitive patterns | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1995-11-21 | — | — | US | disclosed |
| US-5350660-A | Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1994-09-27 | — | — | US | disclosed |
| EP-0595361-A2 | Method of forming micropatterns | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1994-05-04 | — | — | EP | disclosed |
| EP-0588544-A2 | Fine pattern forming material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1994-03-23 | — | — | EP | disclosed |
| EP-0520642-A1 | Resist material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1992-12-30 | — | — | EP | disclosed |
| EP-0440374-A2 | Chemical amplified resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | disclosed |