SCHEMBL234155

SCHEMBL234155

CC(C)N[Si](NC(C)C)(NC(C)C)NC(C)C

nearest known ligand 0.36

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL232673 0.81
SCHEMBL234003 0.81
SCHEMBL235091 0.78 ALDH1A1 (0.33) TDP1
SCHEMBL232281 0.73
SCHEMBL235098 0.73
SCHEMBL233521 0.73 ADH1B (0.30)
SCHEMBL236208 0.73
SCHEMBL235982 0.73
SCHEMBL235568 0.71 ADH1B (0.31)
SCHEMBL233720 0.70 TDP1 (0.33) TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100009546-A1 Aminosilanes for Shallow Trench Isolation Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-01-14 US claimed
EP-2144279-A2 Aminosilanes for shallow trench isolation films Air Products and Chemicals, Inc. (US) 2010-01-13 EP claimed
US-20240026527-A1 METHOD OF DEPOSITING SILICON BASED DIELECTRIC FILM APPLIED MATERIALS, INC. (US) 2024-01-25 US disclosed
US-9418890-B2 Method for tuning a deposition rate during an atomic layer deposition process APPLIED MATERIALS, INC. (US) 2016-08-16 US disclosed
EP-2360190-B1 SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME TOHO TITANIUM CO LTD (JP) 2015-10-14 EP disclosed
EP-2374821-B1 MANUFACTURING METHOD OF SOLID CATALYST COMPONENT AND OF CATALYST FOR OLEFIN POLYMERIZATION TOHO TITANIUM CO LTD (JP) 2015-05-06 EP disclosed
US-20140248772-A1 METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS APPLIED MATERIALS, INC. (US) 2014-09-04 US disclosed
US-8648001-B2 Aminosilane compounds, catalyst components and catalysts for olefin polymerization, and process for production of olefin polymers with the same TOHO TITANIUM CO., LTD. (JP) 2014-02-11 US disclosed
EP-1921092-B1 CATALYST COMPONENT AND CATALYST FOR OLEFIN POLYMERIZATION AND METHOD FOR PRODUCING OLEFIN POLYMER USING THOSE TOHO TITANIUM CO LTD (JP) 2013-10-02 EP disclosed
US-8546290-B2 Solid catalyst component for olefin polymerization, manufacturing method, and catalyst and olefin polymer manufacturing method TOHO TITANIUM CO., LTD. (JP) 2013-10-01 US disclosed
US-8491967-B2 In-situ chamber treatment and deposition process APPLIED MATERIALS, INC. (US) 2013-07-23 US disclosed
US-20100190942-A1 AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME TOHO CATALYST CO., LTD. (JP) 2010-07-29 US disclosed
US-20100062149-A1 METHOD FOR TUNING A DEPOSITION RATE DURING AN ATOMIC LAYER DEPOSITION PROCESS APPLIED MATERIALS, INC. (US) 2010-03-11 US disclosed
US-20100062614-A1 IN-SITU CHAMBER TREATMENT AND DEPOSITION PROCESS APPLIED MATERIALS, INC. 2010-03-11 US disclosed
WO-2010027669-A2 IN-SITU CHAMBER TREATMENT AND DEPOSITION PROCESS APPLIED MATERIALS, INC. (US) 2010-03-11 WO disclosed
EP-2144279-A2 Aminosilanes for shallow trench isolation films Air Products and Chemicals, Inc. (US) 2010-01-13 EP disclosed
EP-1921092-A1 CATALYST COMPONENT AND CATALYST FOR OLEFIN POLYMERIZATION AND METHOD FOR PRODUCING OLEFIN POLYMER USING THOSE Toho Catalyst Co., Ltd. (JP) 2008-05-14 EP disclosed
EP-1908767-A1 AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME Toho Catalyst Co., Ltd. (JP) 2008-04-09 EP disclosed
US-20060199384-A1 Method of forming thin film, and method of manufacturing semiconductor device SONY CORPORATION (JP) 2006-09-07 US disclosed
US-4172108-A SOLID SOLUTIONG SUMITOMO CHEMICAL CO., LTD. (JP) 1979-10-23 US disclosed