⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27793903 | 0.79 | — | — | |
| SCHEMBL4262514 | 0.78 | — | — | |
| SCHEMBL28309433 | 0.78 | — | — | |
| SCHEMBL5404540 | 0.77 | — | — | |
| SCHEMBL335442 | 0.77 | — | — | |
| SCHEMBL8615754 | 0.77 | — | — | |
| SCHEMBL4768394 | 0.77 | — | — | |
| SCHEMBL4171906 | 0.77 | — | — | |
| SCHEMBL31351365 | 0.76 | — | — | |
| SCHEMBL3343490 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5651921-A | Process for preparing a water repellent silica sol | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-07-29 | — | — | US | claimed |
| US-20220153583-A1 | BULK BORON NITRIDE PARTICLES, THERMALLY CONDUCTIVE RESIN COMPOSITION, AND HEAT DISSIPATING MEMBER | DENKA COMPANY LIMITED (JP) | 2022-05-19 | — | — | US | disclosed |
| WO-2020196644-A1 | BULK BORON NITRIDE PARTICLES, THERMALLY CONDUCTIVE RESIN COMPOSITION, AND HEAT DISSIPATING MEMBER | デンカ株式会社 | 2020-10-01 | — | — | WO | disclosed |
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |
| EP-0475132-B1 | Water repellent silica sol and process for preparing the same | IDEMITSU KOSAN CO (JP) | 1998-06-10 | — | — | EP | disclosed |
| US-5651921-A | Process for preparing a water repellent silica sol | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1997-07-29 | — | — | US | disclosed |
| EP-0475132-A1 | Water repellent silica sol and process for preparing the same | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1992-03-18 | — | — | EP | disclosed |