SCHEMBL3338301

SCHEMBL3338301

CO[Si](OC)(OC(Cl)Cl)c1ccccc1

nearest known ligand 0.32

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.32
TSHR P16473 1/20 0.31
CA4 P22748 1/20 0.31
PDE4A P27815 1/20 0.31
PDE4B Q07343 1/20 0.31
PDE4C Q08493 1/20 0.31
PDE4D Q08499 1/20 0.31
KDM4E B2RXH2 1/20 0.30
ALDH1A1 P00352 1/20 0.30
MAPK1 P28482 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27594753 0.86 POLB (0.31) POLBTSHRCA4
SCHEMBL7242289 0.81 POLB (0.33) POLBCA4PDE4APDE4BPDE4C
SCHEMBL37986 0.79 CA4 (0.41) POLBTSHRCA4PDE4APDE4B
SCHEMBL28173769 0.79 POLB (0.32) POLBTSHRCA4PDE4APDE4B
SCHEMBL28173753 0.79 POLB (0.32) POLBCA4PDE4APDE4BPDE4C
SCHEMBL15052233 0.78 IDO1 (0.37) TSHRKDM4EALDH1A1MAPK1SMN1; SMN2
Ammonia Solution, Strong SCHEMBL2330946 0.77 POLB (0.39) POLBTSHRCA4PDE4APDE4B
SCHEMBL1974068 0.77 CA1 (0.41) POLBTSHRCA4PDE4APDE4B
Water SCHEMBL18606224 0.77 POLB (0.39) POLBTSHRCA4PDE4APDE4B
SCHEMBL7190607 0.77 POLB (0.33) POLBCA4PDE4APDE4BPDE4C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115322509-B Composite Janus particle, manufacturing method thereof, coating and laminated body 清华大学 2023-07-25 CN disclosed
CN-115322509-A Composite Janus particle, method for producing same, coating layer, and laminate 清华大学 2022-11-11 CN disclosed
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
CN-101133364-B Composition for resist underlayer film and method for producing same JSR CORP 2013-03-20 CN disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
CN-101133364-A Composition for resist underlayer film and method for producing same JSR CORP (JP) 2008-02-27 CN disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed