⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29549270 | 0.89 | — | — | |
| SCHEMBL13089616 | 0.84 | — | — | |
| SCHEMBL13089498 | 0.78 | — | — | |
| SCHEMBL5598704 | 0.73 | — | — | |
| SCHEMBL21496263 | 0.72 | CA12 (0.38) | — | |
| SCHEMBL448076 | 0.70 | — | — | |
| SCHEMBL704667 | 0.70 | — | — | |
| Hydrochloric Acid SCHEMBL28883845 | 0.69 | DNM1 (0.33) | — | |
| SCHEMBL13089618 | 0.67 | — | — | |
| SCHEMBL37541 | 0.67 | DNM1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8785108-B2 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-07-22 | — | — | US | disclosed |
| US-8268546-B2 | Variations in wettability; optically forming pattern; photocatalyst action upon pattern-wisw exposure;color filters, lenses, printing plates | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-09-18 | — | — | US | disclosed |
| US-20100112311-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2010-05-06 | — | — | US | disclosed |
| US-20090233243-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2009-09-17 | — | — | US | disclosed |
| US-20080254394-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2008-10-16 | — | — | US | disclosed |
| US-20080085478-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2008-04-10 | — | — | US | disclosed |
| US-20080081283-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2008-04-03 | — | — | US | disclosed |