Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5855667 | 0.85 | — | — | |
| SCHEMBL3457963 | 0.84 | — | — | |
| SCHEMBL1493162 | 0.76 | HSD17B10 (0.35) | HSD17B10TDP1 | |
| SCHEMBL4605429 | 0.73 | HSD17B10 (0.30) | HSD17B10TDP1 | |
| SCHEMBL11810259 | 0.71 | — | — | |
| SCHEMBL346590 | 0.67 | — | — | |
| SCHEMBL21518597 | 0.67 | THRB (0.35) | HSD17B10TDP1 | |
| SCHEMBL3502257 | 0.67 | TET2 (0.33) | HSD17B10 | |
| SCHEMBL14721696 | 0.67 | — | — | |
| SCHEMBL56367 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| CN-101133364-B | Composition for resist underlayer film and method for producing same | JSR CORP | 2013-03-20 | — | — | CN | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| CN-101133364-A | Composition for resist underlayer film and method for producing same | JSR CORP (JP) | 2008-02-27 | — | — | CN | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |
| CN-1752845-A | Ray sensitive resin composition for forming interlayer insulation film and interlayer insulation film | JSR CORP (JP) | 2006-03-29 | — | — | CN | disclosed |