SCHEMBL33430

SCHEMBL33430

COC[CH]CS(=O)(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7050624 0.74 CA5A (0.36)
SCHEMBL3156810 0.70
Sulfuric Acid SCHEMBL4623119 0.69 CA5A (0.33)
SCHEMBL491153 0.67
SCHEMBL131499 0.67
SCHEMBL3720138 0.67
SCHEMBL1074969 0.65
SCHEMBL28195696 0.65
SCHEMBL1892678 0.64
Methoxymethane SCHEMBL28772444 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1973587-A2 METHODS AND SYSTEMS FOR PREPARING ANTIMICROBIAL FILMS AND COATINGS Allaccem, Inc. (US) 2008-10-01 EP claimed
WO-2007070801-A2 METHODS AND SYSTEMS FOR PREPARING ANTIMICROBIAL FILMS AND COATINGS ALLACCEM, INC. (US) 2007-06-21 WO claimed
US-6326417-B1 CONTAINING SALICYLIC ACID COMPOUND AS MICROBIOCIDES JENERIC/PENTRON INCORPORATED 2001-12-04 US claimed
US-5866631-A POLYMERIZABLE MONOMER CONTAINING AN ACIDIC GROUP, WATER, ARYL BORATE AND TRANSITION METAL COMPOUND. TOKUYAMA CORPORATION (JP) 1999-02-02 US claimed
CN-112513016-B Sulfur-containing polymerizable monomer and use thereof 尚美德齿科材料有限公司 2023-12-19 CN disclosed
US-11844847-B2 Sulfur-containing polymerizable monomer and use thereof SUN MEDICAL CO., LTD. (JP) 2023-12-19 US disclosed
US-11744782-B2 Separately packed curable composition MITSUI CHEMICALS, INC. (JP) 2023-09-05 US disclosed
EP-3658065-B1 MICRO-APPLICATOR FOR USE WITH DENTAL ADHESIVES KULZER & CO GMBH (DE) 2023-07-26 EP disclosed
CN-112940432-B Polymerizable monomer for dental material, composition, adhesive dental material, and kit 三井化学株式会社 2022-12-30 CN disclosed
US-20220169844-A1 COMPOSITE PARTICLES, KIT, MATERIAL, AND METHOD FOR PRODUCING COMPOSITE PARTICLES SUN MEDICAL CO., LTD. (JP) 2022-06-02 US disclosed
US-11306160-B2 Curable composition MITSUI CHEMICALS, INC. (JP) 2022-04-19 US disclosed
EP-3415539-B1 POLYMERIZABLE COMPOSITION AND KIT THEREOF, AND POLYMERIZATION INITIATOR SUN MEDICAL CO LTD (JP) 2022-03-30 EP disclosed
US-5866631-A POLYMERIZABLE MONOMER CONTAINING AN ACIDIC GROUP, WATER, ARYL BORATE AND TRANSITION METAL COMPOUND. TOKUYAMA CORPORATION (JP) 1999-02-02 US disclosed
US-5834532-A BLEND OF POLYMERIZABLE MONOMER HAVING ACIDIC GROUPS AND AN INITIATOR SUN MEDICAL CO., LTD. (JP) 1998-11-10 US disclosed
US-5766328-A Dental composition for relieving dentin hypersensitivity SUN MEDICAL CO., LTD. (JP) 1998-06-16 US disclosed
EP-0811368-A1 DENTAL PRIMER COMPOSITION AND POLYMERIZATION CATALYST TOKUYAMA CORPORATION (JP) 1997-12-10 EP disclosed
US-5587406-A APPLYING CURABLE PRIMER COMPOSITION COMPRISING POLYMERIZABLE MONOMER HAVING ACID GROUP AND POLYMERIZABLE MONOMER HAVING HYDROXYL GROUP AND POLYMERIZATION INITIATOR TO TOOTH SUN MEDICAL CO., LTD. (JP) 1996-12-24 US disclosed
EP-0744171-A1 DENTAL COMPOSITION FOR HYPERSENSITIVE DENTIN SUN MEDICAL CO., LTD. (JP) 1996-11-27 EP disclosed
EP-0721773-A2 Dental composition for relieving dentin hypersensitivity SUN MEDICAL CO., LTD. (JP) 1996-07-17 EP disclosed
US-5530038-A CONTAINING UNSATURATED MONOMER WITH ACIDIC GROUP, UNSATURATED MONOMER WITH HYDROXYL GROUP, POLYMERIZATION INITIATOR, AMINE COMPOUND, ZIRCONIUM OXIDE AND ORGANIC COMPOSITE FILLERS SUN MEDICAL CO., LTD. (JP) 1996-06-25 US disclosed