Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.50 |
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.43 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.41 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | CA12 | O43570 | 1/20 | 0.40 |
| ▸ | AKR1B10 | O60218 | 1/20 | 0.40 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.40 |
| ▸ | CA4 | P22748 | 1/20 | 0.40 |
| ▸ | CA6 | P23280 | 1/20 | 0.40 |
| ▸ | CA5A | P35218 | 1/20 | 0.40 |
| ▸ | CA7 | P43166 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Styrene SCHEMBL934756 | 0.97 | ALDH1A1 (0.53) | ALDH1A1LMNAADORA3HCAR2L3MBTL1 | |
| Styrene SCHEMBL6258502 | 0.95 | ALDH1A1 (0.45) | ALDH1A1LMNAADORA3HCAR2L3MBTL1 | |
| Styrene SCHEMBL4085004 | 0.93 | ALDH1A1 (0.49) | ALDH1A1LMNAADORA3HCAR2L3MBTL1 | |
| Styrene SCHEMBL2491464 | 0.92 | ALDH1A1 (0.43) | ALDH1A1LMNAADORA3HCAR2L3MBTL1 | |
| Styrene SCHEMBL23923618 | 0.91 | ALDH1A1 (0.42) | ALDH1A1LMNAADORA3HCAR2L3MBTL1 | |
| Styrene SCHEMBL18763986 | 0.91 | ALDH1A1 (0.42) | ALDH1A1LMNAADORA3HCAR2L3MBTL1 | |
| Styrene SCHEMBL21980837 | 0.90 | ALDH1A1 (0.41) | ALDH1A1LMNAADORA3HCAR2L3MBTL1 | |
| Methacrylic Acid SCHEMBL189712 | 0.89 | ALDH1A1 (0.61) | ALDH1A1LMNAHCAR2L3MBTL1KMT2A | |
| Methacrylic Acid SCHEMBL9447782 | 0.89 | ALDH1A1 (0.61) | ALDH1A1LMNAHCAR2L3MBTL1KMT2A | |
| Styrene SCHEMBL28570881 | 0.88 | NR1H4 (0.44) | ALDH1A1LMNAADORA3L3MBTL1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240111211-A1 | PHOTOSENSITIVE RESIN FILM, RESIST PATTERN FORMING METHOD, AND WIRING PATTERN FORMING METHOD | RESONAC CORPORATION (JP) | 2024-04-04 | — | — | US | disclosed |
| CN-111316164-B | Photosensitive resin laminate and method for producing resist pattern | 旭化成株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-116560189-A | Photocurable resin composition and application thereof | 杭州福斯特电子材料有限公司 | 2023-08-08 | — | — | CN | disclosed |
| CN-114585974-A | Photosensitive resin film, method for forming resist pattern, and method for forming wiring pattern | 昭和电工材料株式会社 | 2022-06-03 | — | — | CN | disclosed |
| CN-111684359-A | Photosensitive transfer material, method for manufacturing circuit wiring, and method for manufacturing touch panel | 富士胶片株式会社 | 2020-09-18 | — | — | CN | disclosed |
| CN-111316164-A | Photosensitive resin laminate and method for producing resist pattern | 旭化成株式会社 | 2020-06-19 | — | — | CN | disclosed |
| CN-111201488-A | Method for manufacturing circuit wiring, method for manufacturing touch panel, and method for manufacturing patterned substrate | 富士胶片株式会社 | 2020-05-26 | — | — | CN | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20060194154-A1 | Developer composition | EVERLIGHT USA, INC. (US) | 2006-08-31 | — | — | US | disclosed |
| US-20020119263-A1 | Radiation sensitive composition for color filters, production process therefor, color filter and color liquid crystal display element | JSR CORPORATION (JP) | 2002-08-29 | — | — | US | disclosed |
| US-6120973-A | PHOTOSENSITIVE COMPOSITION AND COLORS WITH POLYMERS | JSR CORPORATION (JP) | 2000-09-19 | — | — | US | disclosed |
| EP-0875788-A1 | Radiation sensitive composition for color filters | JSR Corporation (JP) | 1998-11-04 | — | — | EP | disclosed |