Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.66 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29990876 | 1.00 | TSHR (0.66) | TSHRALDH1A1THRB | |
| SCHEMBL142807 | 1.00 | TSHR (0.66) | TSHRALDH1A1THRB | |
| SCHEMBL156577 | 1.00 | TSHR (0.66) | TSHRALDH1A1THRB | |
| SCHEMBL30918135 | 1.00 | TSHR (0.66) | TSHRALDH1A1THRB | |
| SCHEMBL672401 | 1.00 | TSHR (0.66) | TSHRALDH1A1THRB | |
| SCHEMBL7154371 | 1.00 | TSHR (0.66) | TSHRALDH1A1THRB | |
| SCHEMBL6823542 | 1.00 | TSHR (0.66) | TSHRALDH1A1THRB | |
| SCHEMBL41275 | 1.00 | TSHR (0.66) | TSHRALDH1A1THRB | |
| SCHEMBL2404839 | 1.00 | TSHR (0.66) | TSHRALDH1A1THRB | |
| SCHEMBL29907221 | 1.00 | TSHR (0.66) | TSHRALDH1A1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025018412-A1 | PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-01-23 | — | — | WO | disclosed |
| EP-3429001-B1 | BINDER FOR NONAQUEOUS SECONDARY BATTERY ELECTRODES, SLURRY FOR NONAQUEOUS SECONDARY BATTERY ELECTRODES, ELECTRODE FOR NONAQUEOUS SECONDARY BATTERIES, AND NONAQUEOUS SECONDARY BATTERY | ZEON CORP (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-20230375930-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2023-11-23 | — | — | US | disclosed |
| WO-2023127934-A1 | ENERGY-RAY-CURABLE COMPOSITION FOR THREE-DIMENSIONAL SHAPING USE, DENTAL STRUCTURE, MOUTHPIECE, TEETH-STRAIGHTENING MOUTHPIECE, AND METHOD FOR PRODUCING DENTAL STRUCTURE | クラレノリタケデンタル株式会社 | 2023-07-06 | — | — | WO | disclosed |
| CN-108701833-B | Binder for nonaqueous secondary battery electrode, slurry for nonaqueous secondary battery electrode, electrode for nonaqueous secondary battery, and nonaqueous secondary battery | 日本瑞翁株式会社 | 2022-02-01 | — | — | CN | disclosed |
| US-10910651-B2 | Binder for non-aqueous secondary battery electrode, slurry for non-aqueous secondary battery electrode, electrode for non-aqueous secondary battery, and non-aqueous secondary battery | ZEON CORPORATION (JP) | 2021-02-02 | — | — | US | disclosed |
| WO-2020145178-A1 | INTERPENETRATING NETWORK POLYMER COMPRISING CROSSLINKED ORGANOPOLYSILOXANE AND (METH)ACRYLIC POLYMER, AND METHOD FOR PRODUCING SAME | 信越化学工業株式会社 | 2020-07-16 | — | — | WO | disclosed |
| US-10709530-B2 | Photocurable composition, denture base, and plate denture | MITSUI CHEMICALS, INC. (JP) | 2020-07-14 | — | — | US | disclosed |
| US-10338468-B2 | Photosensitive resin composition, photosensitive resin laminate, resin pattern production method, cured film, and display device | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2019-07-02 | — | — | US | disclosed |
| US-20190097235-A1 | BINDER FOR NON-AQUEOUS SECONDARY BATTERY ELECTRODE, SLURRY FOR NON-AQUEOUS SECONDARY BATTERY ELECTRODE, ELECTRODE FOR NON-AQUEOUS SECONDARY BATTERY, AND NON-AQUEOUS SECONDARY BATTERY | ZEON CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| US-20180014919-A1 | PHOTOCURABLE COMPOSITION, DENTURE BASE, AND PLATE DENTURE | MITSUI CHEMICALS, INC. (JP) | 2018-01-18 | — | — | US | disclosed |
| US-20170285474-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, RESIN PATTERN PRODUCTION METHOD, CURED FILM, AND DISPLAY DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2017-10-05 | — | — | US | disclosed |
| US-8563223-B2 | Photosensitive resin composition and laminate | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2013-10-22 | — | — | US | disclosed |
| US-8361697-B2 | Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern and process for producing printed circuit board, lead frame, semiconductor package and concavoconvex board | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20100297559-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN AND PROCESS FOR PRODUCING PRINTED CIRCUIT BOARD, LEAD FRAME, SEMICONDUCTOR PACKAGE AND CONCAVOCONVEX BOARD | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100119977-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2010-05-13 | — | — | US | disclosed |
| US-6656633-B2 | Binder for electrode for lithium ion secondary battery, and utilization thereof | ZEON CORPORATION (JP) | 2003-12-02 | — | — | US | disclosed |
| US-20020034686-A1 | Electrochemical stability | ZEON CORPORATION (JP) | 2002-03-21 | — | — | US | disclosed |
| US-4194066-A | POLYMERIZING POLYOXYALKYLENE GLYCOL (METH)ACRYLATES | JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JP) | 1980-03-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10709530-B2 | Photocurable composition, denture base, and plate denture | PAM, COPE, ARCN1 | TSHR 3274/4885ALDH1A1 947/4885THRB 1756/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.