SCHEMBL3344950

SCHEMBL3344950

[CH2]C[CH]CC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11468875 0.79
SCHEMBL148792 0.79
SCHEMBL7714062 0.74
SCHEMBL14777661 0.72
SCHEMBL977204 0.69
SCHEMBL23546 0.69
SCHEMBL1328 0.69
SCHEMBL148006 0.67
SCHEMBL20755 0.67
SCHEMBL7125354 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 133 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108689888-A A kind of two guanidine salt of alkyl and preparation method thereof 中国日用化学研究院有限公司 2018-10-23 CN claimed
US-5491262-A COLOR FORMERS FOR TRANSFER IMAGING HILTON DAVIS CHEMICAL CO. (US) 1996-02-13 US claimed
EP-0099329-B1 DITHIO COMPOUNDS, PHARMACEUTICAL PREPARATIONS CONTAINING THEM AND THEIR USE Zyma SA (CH) 1990-10-31 EP claimed
EP-0099329-A1 Dithio compounds, pharmaceutical preparations containing them and their use Zyma SA (CH) 1984-01-25 EP claimed
WO-2024135498-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND 東京応化工業株式会社 2024-06-27 WO disclosed
WO-2024127977-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2024-06-20 WO disclosed
WO-2024122423-A1 RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR 東京応化工業株式会社 2024-06-13 WO disclosed
WO-2024122425-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2024-06-13 WO disclosed
WO-2024117106-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID GENERATOR 東京応化工業株式会社 2024-06-06 WO disclosed
WO-2024116780-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2024-06-06 WO disclosed
CN-110275395-B Resist composition and resist pattern forming method 东京应化工业株式会社 2024-05-17 CN disclosed
WO-2024101390-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND 東京応化工業株式会社 2024-05-16 WO disclosed
WO-2005106868-A1 METAL CHELATES AND THEIR USE IN OPTICAL RECORDING MEDIA HAVING HIGH STORAGE CAPACITY CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2005-11-10 WO disclosed
CN-1455692-A Formulations for neutralization of chemical and biological toxants SANDIA CORP (US) 2003-11-12 CN disclosed
EP-1292560-A1 METHOD FOR PREPARING HYDROXYPHENYL CARBOXYLIC ACID ESTERS Ciba SC Holding AG (CH) 2003-03-19 EP disclosed
WO-2001098249-A1 METHOD FOR PREPARING HYDROXYPHENYL CARBOXYLIC ACID ESTERS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2001-12-27 WO disclosed
EP-0099329-B1 DITHIO COMPOUNDS, PHARMACEUTICAL PREPARATIONS CONTAINING THEM AND THEIR USE Zyma SA (CH) 1990-10-31 EP disclosed
US-4946861-A TREATMENT OF LIVER DISORDERS ZYMA SA (CH) 1990-08-07 US disclosed
US-4818765-A TREATING LIVER, RESPIRATORY TRACT, VASCULAR DISORDERS CIBA-GEIGY CORPORATION (US) 1989-04-04 US disclosed
EP-0099329-A1 Dithio compounds, pharmaceutical preparations containing them and their use Zyma SA (CH) 1984-01-25 EP disclosed