Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.46 |
| ▸ | LMNA | P02545 | 3/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.46 |
| ▸ | GLA | P06280 | 2/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | CASP1 | P29466 | 2/20 | 0.42 |
| ▸ | CASP7 | P55210 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.42 |
| ▸ | RAB9A | P51151 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29660659 | 1.00 | ALDH1A1 (0.55) | ALDH1A1KDM4ESMN1; SMN2LMNAMAPT | |
| SCHEMBL13170780 | 0.79 | ESR2 (0.47) | ALDH1A1KDM4EMAPTHPGDHSD17B10 | |
| SCHEMBL13170778 | 0.78 | CA1 (0.55) | ALDH1A1KDM4EMAPTGLAHPGD | |
| SCHEMBL20291561 | 0.76 | MEN1 (0.49) | ALDH1A1KDM4ESMN1; SMN2LMNAMAPT | |
| SCHEMBL21808809 | 0.76 | ESR2 (0.43) | LMNATSHRESR2CA1CA2 | |
| SCHEMBL786440 | 0.75 | METAP1 (0.53) | ALDH1A1KDM4ELMNAMAPTCYP1A2 | |
| SCHEMBL28165137 | 0.75 | ADORA2A (0.64) | ALDH1A1KDM4ECYP1A2HPGDHSD17B10 | |
| SCHEMBL14529177 | 0.75 | CYP1A2 (0.49) | ALDH1A1KDM4ESMN1; SMN2LMNAMAPT | |
| SCHEMBL30594229 | 0.74 | CYP1A2 (0.49) | ALDH1A1KDM4ESMN1; SMN2LMNAMAPT | |
| SCHEMBL27909137 | 0.73 | ESR2 (0.52) | ALDH1A1KDM4EKMT2ATSHRESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-A | Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application | 常州强力电子新材料股份有限公司 | 2019-10-22 | — | — | CN | claimed |
| CN-110114376-B | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2022-06-14 | — | — | CN | disclosed |
| EP-3339331-B1 | COMPOSITION | ADEKA CORP (JP) | 2022-02-16 | — | — | EP | disclosed |
| CN-108419438-B | Coloring composition | 株式会社艾迪科 | 2021-10-01 | — | — | CN | disclosed |
| CN-112154167-A | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2020-12-29 | — | — | CN | disclosed |
| CN-111566173-A | Coating composition, method for curing the composition, barrier film, and method for producing cured product | 株式会社艾迪科 | 2020-08-21 | — | — | CN | disclosed |
| WO-2020021969-A1 | COMPOSITION, CURED PRODUCT, OPTICAL FILTER, AND PRODUCTION METHOD FOR CURED PRODUCT | 株式会社ADEKA | 2020-01-30 | — | — | WO | disclosed |
| CN-110357989-A | Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application | 常州强力电子新材料股份有限公司 | 2019-10-22 | — | — | CN | disclosed |
| CN-110114376-A | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2019-08-09 | — | — | CN | disclosed |
| CN-108419438-A | Coloured composition | 株式会社艾迪科 | 2018-08-17 | — | — | CN | disclosed |
| EP-3339331-A1 | COMPOSITION | Adeka Corporation (JP) | 2018-06-27 | — | — | EP | disclosed |
| CN-107636024-A | Composition | 株式会社艾迪科 | 2018-01-26 | — | — | CN | disclosed |
| CN-101779165-B | Photosensitive resin composition and laminate thereof | ASAHI KASEI E MATERIALS CORP | 2014-09-24 | — | — | CN | disclosed |
| CN-102844709-B | Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board | NICHIGO MORTON CO LTD | 2014-08-20 | — | — | CN | disclosed |
| CN-102844709-A | Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board | NICHIGO MORTON CO LTD | 2012-12-26 | — | — | CN | disclosed |
| CN-101449208-B | Photosensitive resin composition and laminate | ASAHI KASEI E-MATERIALS CORP. (JP) | 2011-12-14 | — | — | CN | disclosed |
| CN-101779165-A | Photosensitive resin composition and laminate thereof | ASAHI KASEI EMD CORP | 2010-07-14 | — | — | CN | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| CN-101568882-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-10-28 | — | — | CN | disclosed |
| CN-101449208-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-06-03 | — | — | CN | disclosed |