Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.34 |
| ▸ | TP53 | P04637 | 3/20 | 0.34 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | PRKCA | P17252 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | PDE4A | P27815 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26391491 | 0.91 | TSHR (0.44) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL3268370 | 0.89 | TSHR (0.43) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL26391494 | 0.88 | TSHR (0.44) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL1245547 | 0.84 | TSHR (0.47) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL25170339 | 0.84 | TSHR (0.47) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL13109814 | 0.84 | TSHR (0.53) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL8039586 | 0.84 | TSHR (0.53) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL1721382 | 0.84 | TSHR (0.53) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL20752381 | 0.83 | TSHR (0.46) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL304806 | 0.79 | TSHR (0.52) | TSHRALDH1A1TP53HIF1ACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8098012-B2 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2012-01-17 | — | — | US | claimed |
| US-7763402-B2 | Photosensitive resin composition | DONGJIN SEMICHEM CO., LTD. (KR) | 2010-07-27 | — | — | US | claimed |
| EP-1646512-B1 | INK JET RECORDING MEDIUM | BASF SE (DE) | 2010-06-09 | — | — | EP | claimed |
| EP-1922373-B1 | ACRYLATED POLYAMIDE-CONTAINING PRINTING INKS | SUN CHEMICAL CORP (US) | 2010-03-03 | — | — | EP | claimed |
| US-20090317604-A1 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2009-12-24 | — | — | US | claimed |
| US-7588877-B2 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD. (KR) | 2009-09-15 | — | — | US | claimed |
| EP-1828273-B1 | ACRYLATED POLYAMIDES,THEIR PREPARATION AND USES | SUN CHEMICAL LTD (GB) | 2008-05-07 | — | — | EP | claimed |
| US-20080051483-A1 | PHOTOSENSITIVE RESIN COMPOSITION | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-02-28 | — | — | US | claimed |
| WO-2007123324-A1 | PASTE COMPOSITION FOR PRINTING | DONGJIN SEMICHEM CO., LTD (KR) | 2007-11-01 | — | — | WO | claimed |
| EP-1350633-B1 | Presensitized plate for making lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 2007-02-21 | — | — | EP | claimed |
| US-20060115767-A1 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD., A CORPORATION ORGANIZED UNDER THE LAWS OF THE REPUBLIC OF KOREA (KR) | 2006-06-01 | — | — | US | claimed |
| EP-4004125-B1 | MIXING SYSTEM FOR PREPARING LOW VOC AQUEOUS COATING AGENTS | BASF COATINGS GMBH (DE) | 2023-09-06 | — | — | EP | disclosed |
| EP-4004125-A1 | MIXING SYSTEM FOR PRODUCING AQUEOUS COATING AGENTS WITH A LOW VOC | BASF Coatings GmbH (DE) | 2022-06-01 | — | — | EP | disclosed |
| WO-2021018594-A1 | MIXING SYSTEM FOR PRODUCING AQUEOUS COATING AGENTS WITH A LOW VOC | BASF COATINGS GMBH (DE) | 2021-02-04 | — | — | WO | disclosed |
| EP-3265878-B1 | METHOD FOR PRODUCING A TRIDIMENSIONAL STRUCTURE USING TWO PRE-SUPPORTING MATERIALS | BASF SE (DE) | 2019-04-10 | — | — | EP | disclosed |
| WO-2007123324-A1 | PASTE COMPOSITION FOR PRINTING | DONGJIN SEMICHEM CO., LTD (KR) | 2007-11-01 | — | — | WO | disclosed |
| EP-1445120-B1 | Photosensitive lithographic printing plate | FUJIFILM CORP (JP) | 2007-07-18 | — | — | EP | disclosed |
| US-20060115767-A1 | Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel | SAMSUNG SDI CO., LTD., A CORPORATION ORGANIZED UNDER THE LAWS OF THE REPUBLIC OF KOREA (KR) | 2006-06-01 | — | — | US | disclosed |
| US-5811219-A | PHOTOSENSITIVE BLENDS COMPRISING AN ACRYLATE COPOLYMER BINDER, A MULTI-THIOL COMPOUND PHOTOINITIATOR; HEAT RESISTANCE, COLORFASTNESS, CHROMATING, STABILITY | CHEIL SYNTHETICS INCORPORATION (KR) | 1998-09-22 | — | — | US | disclosed |
| EP-0725285-A1 | Pigment-dispersed photoresist composition for color filter of liquid crystal display | Cheil Synthetics Incorporation (KR) | 1996-08-07 | — | — | EP | disclosed |